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U.S. Department of Energy
Office of Scientific and Technical Information

Efg Crystal Growth Apparatus And Method

Patent ·
OSTI ID:880419

An improved mechanical arrangement controls the introduction of silicon particles into an EFG (Edge-defined Film-fed Growth) crucible/die unit for melt replenishment during a crystal growth run. A feeder unit injects silicon particles upwardly through a center hub of the crucible/die unit and the mechanical arrangement intercepts the injected particles and directs them so that they drop into the melt in a selected region of the crucible and at velocity which reduces splashing, whereby to reduce the likelihood of interruption of the growth process due to formation of a solid mass of silicon on the center hub and adjoining components. The invention also comprises use of a Faraday ring to alter the ratio of the electrical currents flowing through primary and secondary induction heating coils that heat the crucible die unit and the mechanical arrangement.

Assignee:
ASE Americas, Inc. (Billerica, MA)
Patent Number(s):
US 6562132
Application Number:
10/826073
OSTI ID:
880419
Country of Publication:
United States
Language:
English

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