Self-Assembled Monolayer And Method Of Making

Patent · Tue Jun 22 00:00:00 EDT 2004

OSTI ID:879911

Fryxell, Glen E ^[1]; Zemanian, Thomas S ^[2]; Liu, Jun ^[3]; Shin, Yongsoon ^[2]

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1. Kennewick, WA
2. Richland, WA
3. West Richland, WA

According to the present invention, the previously known functional material having a self-assembled monolayer on a substrate has a plurality of assembly molecules each with an assembly atom with a plurality of bonding sites (four sites when silicon is the assembly molecule) wherein a bonding fraction (or fraction) of fully bonded assembly atoms (the plurality of bonding sites bonded to an oxygen atom) has a maximum when made by liquid solution deposition, for example a maximum of 40% when silicon is the assembly molecule, and maximum surface density of assembly molecules was 5 silanes per square nanometer. Note that bonding fraction and surface population are independent parameters. The method of the present invention is an improvement to the known method for making a siloxane layer on a substrate, wherein instead of a liquid phase solution chemistry, the improvement is a supercritical phase chemistry. The present invention has the advantages of greater fraction of oxygen bonds, greater surface density of assembly molecules and reduced time for reaction of about 5 minutes to about 24 hours.

• Research Organization: Pacific Northwest National Laboratory (PNNL), Richland, WA (United States)
• DOE Contract Number: AC06-76RL01830
• Assignee: Battelle Memorial Institute (Richland, WA)
• Patent Number(s): US 6753038
• Application Number: 10/346866
• OSTI ID: 879911
• Country of Publication: United States
• Language: English