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Title: Thin-Film Polarizers for the OMEGA EP Laser System

Conference · · in Laser-Induced Damage in Optical Materials: 2005, edited by G. J. Exarhos, A. H. Guenther, K. L. Lewis, D. Ristau, M. J. Soileau, and C. J. Stolz (SPIE, Bellingham, WA, 2005)
OSTI ID:876673

Thin-film polarizers are essential components of large laser systems such as OMEGA EP and the NIF because of the need to switch the beam out of the primary laser cavity (in conjunction with a plasma-electrode Pockels cell) as well as providing a well-defined linear polarization for frequency conversion and protecting the system from back-reflected light. The design and fabrication of polarizers for pulse-compressed laser systems is especially challenging because of the spectral bandwidth necessary for chirped-pulse amplification.

Research Organization:
Laboratory for Laser Energetics, University of Rochester, Rochester, NY
Sponsoring Organization:
USDOE
DOE Contract Number:
FC52-92SF19460
OSTI ID:
876673
Report Number(s):
DOE/SF/19460-655; 1616; 2005-78; TRN: US0703398
Journal Information:
in Laser-Induced Damage in Optical Materials: 2005, edited by G. J. Exarhos, A. H. Guenther, K. L. Lewis, D. Ristau, M. J. Soileau, and C. J. Stolz (SPIE, Bellingham, WA, 2005), Vol. 5991; Conference: Boulder Damage Symposium XXXVII, Boulder, CO, 19-21 September 2005
Country of Publication:
United States
Language:
English

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