Diffraction spectral filter for use in extreme-UV lithography condenser

Patent · Tue Jan 01 00:00:00 EST 2002

OSTI ID:874831

Sweatt, William C ^[1]; Tichenor, Daniel A ^[2]; Bernardez, Luis J ^[3]

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1. Albuquerque, NM
2. Castro Valley, CA
3. Livermore, CA

A condenser system for generating a beam of radiation includes a source of radiation light that generates a continuous spectrum of radiation light; a condenser comprising one or more first optical elements for collecting radiation from the source of radiation light and for generating a beam of radiation; and a diffractive spectral filter for separating first radiation light having a particular wavelength from the continuous spectrum of radiation light. Cooling devices can be employed to remove heat generated. The condenser system can be used with a ringfield camera in projection lithography.

• Research Organization: Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
• DOE Contract Number: AC04-94AL85000
• Assignee: EUV LLC (Santa Clara, CA)
• Patent Number(s): US 6469827
• OSTI ID: 874831
• Country of Publication: United States
• Language: English

Related Subjects

diffraction
spectral
filter
extreme-uv
lithography
condenser
generating
beam
radiation
source
light
generates
continuous
spectrum
comprising
optical
elements
collecting
diffractive
separating
wavelength
cooling
devices
employed
remove
heat
generated
ringfield
camera
projection
remove heat
extreme-uv lithography
/359/355/378/