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Title: Extreme-UV lithography vacuum chamber zone seal

Abstract

Control of particle contamination on the reticle and carbon contamination of optical surfaces in photolithography systems can be achieved by the establishment of multiple pressure zones in the photolithography systems. The different zones will enclose the reticle, projection optics, wafer, and other components of system. The system includes a vacuum apparatus that includes: a housing defining a vacuum chamber; one or more metrology trays situated within the vacuum chamber each of which is supported by at least one support member, wherein the tray separates the vacuum chamber into a various compartments that are maintained at different pressures; and conductance seal devices for adjoining the perimeter of each tray to an inner surface of the housing wherein the tray is decoupled from vibrations emanating from the inner surface of the housing.

Inventors:
 [1];  [2];  [3];  [4]
  1. (Tracy, CA)
  2. (Manteca, CA)
  3. (San Ramon, CA)
  4. (Livermore, CA)
Publication Date:
Research Org.:
SANDIA CORP
OSTI Identifier:
874189
Patent Number(s):
US 6333775
Assignee:
EUV LLC (Santa Clara, CA) SNL
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
extreme-uv; lithography; vacuum; chamber; zone; seal; control; particle; contamination; reticle; carbon; optical; surfaces; photolithography; systems; achieved; establishment; multiple; pressure; zones; enclose; projection; optics; wafer; components; apparatus; housing; defining; metrology; trays; situated; supported; support; tray; separates; compartments; maintained; pressures; conductance; devices; adjoining; perimeter; inner; surface; decoupled; vibrations; emanating; vacuum chamber; extreme-uv lithography; carbon contamination; lithography systems; optical surface; /355/277/

Citation Formats

Haney, Steven J., Herron, Donald Joe, Klebanoff, Leonard E., and Replogle, William C. Extreme-UV lithography vacuum chamber zone seal. United States: N. p., 2001. Web.
Haney, Steven J., Herron, Donald Joe, Klebanoff, Leonard E., & Replogle, William C. Extreme-UV lithography vacuum chamber zone seal. United States.
Haney, Steven J., Herron, Donald Joe, Klebanoff, Leonard E., and Replogle, William C. Mon . "Extreme-UV lithography vacuum chamber zone seal". United States. https://www.osti.gov/servlets/purl/874189.
@article{osti_874189,
title = {Extreme-UV lithography vacuum chamber zone seal},
author = {Haney, Steven J. and Herron, Donald Joe and Klebanoff, Leonard E. and Replogle, William C.},
abstractNote = {Control of particle contamination on the reticle and carbon contamination of optical surfaces in photolithography systems can be achieved by the establishment of multiple pressure zones in the photolithography systems. The different zones will enclose the reticle, projection optics, wafer, and other components of system. The system includes a vacuum apparatus that includes: a housing defining a vacuum chamber; one or more metrology trays situated within the vacuum chamber each of which is supported by at least one support member, wherein the tray separates the vacuum chamber into a various compartments that are maintained at different pressures; and conductance seal devices for adjoining the perimeter of each tray to an inner surface of the housing wherein the tray is decoupled from vibrations emanating from the inner surface of the housing.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2001},
month = {1}
}

Patent:

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