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Title: Process for fabricating high reflectance-low stress Mo--Si multilayer reflective coatings

Abstract

A high reflectance-low stress Mo--Si multilayer reflective coating particularly useful for the extreme ultraviolet (EUV) wavelength region. While the multilayer reflective coating has particular application for EUV lithography, it has numerous other applications where high reflectance and low stress multilayer coatings are utilized. Multilayer coatings having high near-normal incidence reflectance (R.gtoreq.65%) and low residual stress (.ltoreq.100 MPa) have been produced using thermal and non-thermal approaches. The thermal approach involves heating the multilayer coating to a given temperature for a given time after deposition in order to induce structural changes in the multilayer coating that will have an overall "relaxation" effect without reducing the reflectance significantly.

Inventors:
 [1];  [2]
  1. Livermore, CA
  2. Sunol, CA
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
OSTI Identifier:
874089
Patent Number(s):
US 6309705
Assignee:
The Regents of the University of California (Oakland, CA)
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
process; fabricating; reflectance-low; stress; mo-si; multilayer; reflective; coatings; coating; useful; extreme; ultraviolet; euv; wavelength; region; application; lithography; numerous; applications; reflectance; utilized; near-normal; incidence; rgtoreq65; residual; ltoreq100; mpa; produced; thermal; non-thermal; approaches; approach; involves; heating; temperature; time; deposition; induce; structural; changes; overall; relaxation; effect; reducing; significantly; extreme ultraviolet; residual stress; wavelength region; reflective coating; multilayer reflective; /427/

Citation Formats

Montcalm, Claude, and Mirkarimi, Paul B. Process for fabricating high reflectance-low stress Mo--Si multilayer reflective coatings. United States: N. p., 2001. Web.
Montcalm, Claude, & Mirkarimi, Paul B. Process for fabricating high reflectance-low stress Mo--Si multilayer reflective coatings. United States.
Montcalm, Claude, and Mirkarimi, Paul B. 2001. "Process for fabricating high reflectance-low stress Mo--Si multilayer reflective coatings". United States. https://www.osti.gov/servlets/purl/874089.
@article{osti_874089,
title = {Process for fabricating high reflectance-low stress Mo--Si multilayer reflective coatings},
author = {Montcalm, Claude and Mirkarimi, Paul B},
abstractNote = {A high reflectance-low stress Mo--Si multilayer reflective coating particularly useful for the extreme ultraviolet (EUV) wavelength region. While the multilayer reflective coating has particular application for EUV lithography, it has numerous other applications where high reflectance and low stress multilayer coatings are utilized. Multilayer coatings having high near-normal incidence reflectance (R.gtoreq.65%) and low residual stress (.ltoreq.100 MPa) have been produced using thermal and non-thermal approaches. The thermal approach involves heating the multilayer coating to a given temperature for a given time after deposition in order to induce structural changes in the multilayer coating that will have an overall "relaxation" effect without reducing the reflectance significantly.},
doi = {},
url = {https://www.osti.gov/biblio/874089}, journal = {},
number = ,
volume = ,
place = {United States},
year = {2001},
month = {1}
}