Anisotropy-based crystalline oxide-on-semiconductor material
- Kingston, TN
- Oak Ridge, TN
A semiconductor structure and device for use in a semiconductor application utilizes a substrate of semiconductor-based material, such as silicon, and a thin film of a crystalline oxide whose unit cells are capable of exhibiting anisotropic behavior overlying the substrate surface. Within the structure, the unit cells of the crystalline oxide are exposed to an in-plane stain which influences the geometric shape of the unit cells and thereby arranges a directional-dependent quality of the unit cells in a predisposed orientation relative to the substrate. This predisposition of the directional-dependent quality of the unit cells enables the device to take beneficial advantage of characteristics of the structure during operation. For example, in the instance in which the crystalline oxide of the structure is a perovskite, a spinel or an oxide of similarly-related cubic structure, the structure can, within an appropriate semiconductor device, exhibit ferroelectric, piezoelectric, pyroelectric, electro-optic, ferromagnetic, antiferromagnetic, magneto-optic or large dielectric properties that synergistically couple to the underlying semiconductor substrate.
- Research Organization:
- Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
- DOE Contract Number:
- AC05-96OR22464
- Assignee:
- UT-Battelle, LLC (Oak Ridge, TN)
- Patent Number(s):
- US 6093242
- OSTI ID:
- 873109
- Country of Publication:
- United States
- Language:
- English
Domain structure and polarization reversal in films of ferroelectric bismuth titanate
|
journal | February 1972 |
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crystalline
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material
semiconductor
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anisotropic
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surface
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in-plane
stain
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arranges
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predisposed
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perovskite
spinel
similarly-related
cubic
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electro-optic
ferromagnetic
antiferromagnetic
magneto-optic
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underlying semiconductor
crystalline oxide
predisposed orientation
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semiconductor material
substrate surface
semiconductor device
unit cell
orientation relative
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