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Title: Chemical vapor deposition of aluminum oxide

Abstract

An aluminum oxide film is deposited on a heated substrate by CVD from one or more alkylaluminum alkoxide compounds having composition R.sub.n Al.sub.2 (OR').sub.6-n, wherein R and R' are alkyl groups and n is in the range of 1 to 5.

Inventors:
 [1];  [2];  [1]
  1. (Cambridge, MA)
  2. (Cleveland, OH)
Publication Date:
Research Org.:
MIDWEST RESEARCH INSTITUTE
OSTI Identifier:
872905
Patent Number(s):
US 6037003
Assignee:
President and Fellows of Harvard College (Cambridge, MA) NREL
DOE Contract Number:  
AC02-83CH10093
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
chemical; vapor; deposition; aluminum; oxide; film; deposited; heated; substrate; cvd; alkylaluminum; alkoxide; compounds; composition; 6-n; alkyl; range; aluminum oxide; chemical vapor; vapor deposition; oxide film; heated substrate; alkoxide compound; oxide compounds; alkoxide compounds; /427/

Citation Formats

Gordon, Roy, Kramer, Keith, and Liu, Xinye. Chemical vapor deposition of aluminum oxide. United States: N. p., 2000. Web.
Gordon, Roy, Kramer, Keith, & Liu, Xinye. Chemical vapor deposition of aluminum oxide. United States.
Gordon, Roy, Kramer, Keith, and Liu, Xinye. Sat . "Chemical vapor deposition of aluminum oxide". United States. https://www.osti.gov/servlets/purl/872905.
@article{osti_872905,
title = {Chemical vapor deposition of aluminum oxide},
author = {Gordon, Roy and Kramer, Keith and Liu, Xinye},
abstractNote = {An aluminum oxide film is deposited on a heated substrate by CVD from one or more alkylaluminum alkoxide compounds having composition R.sub.n Al.sub.2 (OR').sub.6-n, wherein R and R' are alkyl groups and n is in the range of 1 to 5.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2000},
month = {1}
}

Patent:

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