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Title: Erosion resistant nozzles for laser plasma extreme ultraviolet (EUV) sources

Abstract

A gas nozzle having an increased resistance to erosion from energetic plasma particles generated by laser plasma sources. By reducing the area of the plasma-facing portion of the nozzle below a critical dimension and fabricating the nozzle from a material that has a high EUV transmission as well as a low sputtering coefficient such as Be, C, or Si, it has been shown that a significant reduction in reflectance loss of nearby optical components can be achieved even after exposing the nozzle to at least 10.sup.7 Xe plasma pulses.

Inventors:
 [1];  [2]
  1. (Livermore, CA)
  2. (Tracy, CA)
Publication Date:
Research Org.:
SANDIA CORP
OSTI Identifier:
872796
Patent Number(s):
US 6011267
Application Number:
09/032,224
Assignee:
EUV LLC (Santa Clara, CA) SNL
DOE Contract Number:  
AC04 -94DP85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
erosion; resistant; nozzles; laser; plasma; extreme; ultraviolet; euv; sources; gas; nozzle; increased; resistance; energetic; particles; generated; reducing; plasma-facing; portion; below; critical; dimension; fabricating; material; transmission; sputtering; coefficient; shown; significant; reduction; reflectance; loss; nearby; optical; components; achieved; exposing; 10; xe; pulses; plasma sources; laser plasma; significant reduction; optical components; plasma source; extreme ultraviolet; critical dimension; particles generated; erosion resistant; optical component; increased resistance; energetic plasma; plasma extreme; /250/378/

Citation Formats

Kubiak, Glenn D., and Bernardez, II, Luis J. Erosion resistant nozzles for laser plasma extreme ultraviolet (EUV) sources. United States: N. p., 2000. Web.
Kubiak, Glenn D., & Bernardez, II, Luis J. Erosion resistant nozzles for laser plasma extreme ultraviolet (EUV) sources. United States.
Kubiak, Glenn D., and Bernardez, II, Luis J. Tue . "Erosion resistant nozzles for laser plasma extreme ultraviolet (EUV) sources". United States. https://www.osti.gov/servlets/purl/872796.
@article{osti_872796,
title = {Erosion resistant nozzles for laser plasma extreme ultraviolet (EUV) sources},
author = {Kubiak, Glenn D. and Bernardez, II, Luis J.},
abstractNote = {A gas nozzle having an increased resistance to erosion from energetic plasma particles generated by laser plasma sources. By reducing the area of the plasma-facing portion of the nozzle below a critical dimension and fabricating the nozzle from a material that has a high EUV transmission as well as a low sputtering coefficient such as Be, C, or Si, it has been shown that a significant reduction in reflectance loss of nearby optical components can be achieved even after exposing the nozzle to at least 10.sup.7 Xe plasma pulses.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2000},
month = {1}
}

Patent:

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