Hydrogen and moisture getter and absorber for sealed devices
- Overland Park, KS
- Lee's Summit, MO
The present invention is a hydrogen getter and method for formulating and using the getter. This getter effectively removes hydrogen gas typically present in many hermetically-sealed electronic applications where the presence of such gas would otherwise be harmful to the electronics. The getter is a non-organic composition, usable in a wide range of temperatures as compared to organic getters. Moreover, the getter is formulated to be used without the need for the presence of oxygen. The getter is comprised of effective amounts of an oxide of a platinum group metal, a desiccant, and a gas permeable binder which preferably is cured after composition in an oxygen-bearing environment at about 150 to about 205 degrees centigrade.
- Research Organization:
- Kansas City Plant (KCP), Kansas City, MO (United States)
- DOE Contract Number:
- AC04-76DP00613
- Assignee:
- AlliedSignal Inc. (Morris Township, NJ)
- Patent Number(s):
- US 5888925
- OSTI ID:
- 872229
- Country of Publication:
- United States
- Language:
- English
Hydrogen Effects on Reliability of GaAs MMICs
|
book | January 1990 |
Donor neutralization in GaAs(Si) by atomic hydrogen
|
journal | July 1985 |
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Related Subjects
moisture
getter
absorber
sealed
devices
method
formulating
effectively
removes
gas
typically
hermetically-sealed
electronic
applications
presence
otherwise
harmful
electronics
non-organic
composition
usable
wide
range
temperatures
compared
organic
getters
moreover
formulated
oxygen
comprised
effective
amounts
oxide
platinum
metal
desiccant
permeable
binder
preferably
cured
oxygen-bearing
environment
150
205
degrees
centigrade
effective amount
hydrogen gas
wide range
hydrogen getter
degrees centigrade
gas permeable
electronic applications
effectively removes
moisture getter
effectively remove
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