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Title: Hydrogen and moisture getter and absorber for sealed devices

Patent ·
OSTI ID:872229

The present invention is a hydrogen getter and method for formulating and using the getter. This getter effectively removes hydrogen gas typically present in many hermetically-sealed electronic applications where the presence of such gas would otherwise be harmful to the electronics. The getter is a non-organic composition, usable in a wide range of temperatures as compared to organic getters. Moreover, the getter is formulated to be used without the need for the presence of oxygen. The getter is comprised of effective amounts of an oxide of a platinum group metal, a desiccant, and a gas permeable binder which preferably is cured after composition in an oxygen-bearing environment at about 150 to about 205 degrees centigrade.

Research Organization:
Kansas City Plant (KCP), Kansas City, MO (United States)
DOE Contract Number:
AC04-76DP00613
Assignee:
AlliedSignal Inc. (Morris Township, NJ)
Patent Number(s):
US 5888925
OSTI ID:
872229
Country of Publication:
United States
Language:
English

References (2)

Hydrogen Effects on Reliability of GaAs MMICs book January 1990
Donor neutralization in GaAs(Si) by atomic hydrogen journal July 1985