Miniature pulsed vacuum arc plasma gun and apparatus for thin-film fabrication

Patent · Thu Jan 01 00:00:00 EST 1998

OSTI ID:871998

Brown, Ian G ^[1]; MacGill, Robert A ^[2]; Galvin, James E ^[3]; Ogletree, David F ^[4]; Salmeron, Miquel ^[4]

---

1. Berkeley, CA
2. Richmond, CA
3. Emmeryville, CA
4. El Cerrito, CA

A miniature (dime-size in cross-section) vapor vacuum arc plasma gun is described for use in an apparatus to produce thin films. Any conductive material can be layered as a film on virtually any substrate. Because the entire apparatus can easily be contained in a small vacuum chamber, multiple dissimilar layers can be applied without risk of additional contamination. The invention has special applications in semiconductor manufacturing.

• Research Organization: Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
• DOE Contract Number: AC03-76SF00098
• Assignee: Regents of University of California (Oakland, CA)
• Patent Number(s): US 5841236
• OSTI ID: 871998
• Country of Publication: United States
• Language: English

Related Subjects

miniature
pulsed
vacuum
plasma
gun
apparatus
thin-film
fabrication
dime-size
cross-section
vapor
described
produce
films
conductive
material
layered
film
virtually
substrate
entire
easily
contained
chamber
multiple
dissimilar
layers
applied
risk
additional
contamination
special
applications
semiconductor
manufacturing
vacuum chamber
conductive material
plasma gun
vapor vacuum
semiconductor manufacturing
special applications
special application
dissimilar layers
/315/204/