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Title: Particle dispersing system and method for testing semiconductor manufacturing equipment

Abstract

The system and method prepare a gas stream comprising particles at a known concentration using a particle disperser for moving particles from a reservoir of particles into a stream of flowing carrier gas. The electrostatic charges on the particles entrained in the carrier gas are then neutralized or otherwise altered, and the resulting particle-laden gas stream is then diluted to provide an acceptable particle concentration. The diluted gas stream is then split into a calibration stream and the desired output stream. The particles in the calibration stream are detected to provide an indication of the actual size distribution and concentration of particles in the output stream that is supplied to a process chamber being analyzed. Particles flowing out of the process chamber within a vacuum pumping system are detected, and the output particle size distribution and concentration are compared with the particle size distribution and concentration of the calibration stream in order to determine the particle transport characteristics of a process chamber, or to determine the number of particles lodged in the process chamber as a function of manufacturing process parameters such as pressure, flowrate, temperature, process chamber geometry, particle size, particle charge, and gas composition.

Inventors:
 [1];  [1];  [2];  [3];  [3]
  1. (Sunnyvale, CA)
  2. (Milpitas, CA)
  3. (Albuquerque, NM)
Publication Date:
Research Org.:
Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA
OSTI Identifier:
871689
Patent Number(s):
US 5777245
Assignee:
Applied Materials, Inc. (Santa Clara, CA) SNL
DOE Contract Number:  
AC04-76
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
particle; dispersing; method; testing; semiconductor; manufacturing; equipment; prepare; gas; stream; comprising; particles; concentration; disperser; moving; reservoir; flowing; carrier; electrostatic; charges; entrained; neutralized; otherwise; altered; resulting; particle-laden; diluted; provide; acceptable; split; calibration; desired; output; detected; indication; size; distribution; supplied; process; chamber; analyzed; vacuum; pumping; compared; determine; transport; characteristics; lodged; function; parameters; pressure; flowrate; temperature; geometry; charge; composition; vacuum pumping; process parameters; gas composition; particles entrained; particle transport; manufacturing process; size distribution; carrier gas; gas stream; particle size; stream comprising; process parameter; desired output; particle concentration; vacuum pump; particle-laden gas; semiconductor manufacturing; comprising particles; moving particles; electrostatic charge; static charges; /73/

Citation Formats

Chandrachood, Madhavi, Ghanayem, Steve G., Cantwell, Nancy, Rader, Daniel J., and Geller, Anthony S. Particle dispersing system and method for testing semiconductor manufacturing equipment. United States: N. p., 1998. Web.
Chandrachood, Madhavi, Ghanayem, Steve G., Cantwell, Nancy, Rader, Daniel J., & Geller, Anthony S. Particle dispersing system and method for testing semiconductor manufacturing equipment. United States.
Chandrachood, Madhavi, Ghanayem, Steve G., Cantwell, Nancy, Rader, Daniel J., and Geller, Anthony S. Thu . "Particle dispersing system and method for testing semiconductor manufacturing equipment". United States. doi:. https://www.osti.gov/servlets/purl/871689.
@article{osti_871689,
title = {Particle dispersing system and method for testing semiconductor manufacturing equipment},
author = {Chandrachood, Madhavi and Ghanayem, Steve G. and Cantwell, Nancy and Rader, Daniel J. and Geller, Anthony S.},
abstractNote = {The system and method prepare a gas stream comprising particles at a known concentration using a particle disperser for moving particles from a reservoir of particles into a stream of flowing carrier gas. The electrostatic charges on the particles entrained in the carrier gas are then neutralized or otherwise altered, and the resulting particle-laden gas stream is then diluted to provide an acceptable particle concentration. The diluted gas stream is then split into a calibration stream and the desired output stream. The particles in the calibration stream are detected to provide an indication of the actual size distribution and concentration of particles in the output stream that is supplied to a process chamber being analyzed. Particles flowing out of the process chamber within a vacuum pumping system are detected, and the output particle size distribution and concentration are compared with the particle size distribution and concentration of the calibration stream in order to determine the particle transport characteristics of a process chamber, or to determine the number of particles lodged in the process chamber as a function of manufacturing process parameters such as pressure, flowrate, temperature, process chamber geometry, particle size, particle charge, and gas composition.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Thu Jan 01 00:00:00 EST 1998},
month = {Thu Jan 01 00:00:00 EST 1998}
}

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