Chemical vapor deposition of mullite coatings

Title: Chemical vapor deposition of mullite coatings

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Abstract

This invention is directed to the creation of crystalline mullite coatings having uniform microstructure by chemical vapor deposition (CVD). The process comprises the steps of establishing a flow of reactants which will yield mullite in a CVD reactor, and depositing a crystalline coating from the reactant flow. The process will yield crystalline coatings which are dense and of uniform thickness.

Inventors:

Sarin, Vinod ^[1]; Mulpuri, Rao ^[2]

Lexington, MA
Boston, MA

Publication Date:: 1998-01-01

Research Org.:: Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)

OSTI Identifier:: 871606

Patent Number(s):: US 5763008

Assignee:: Trustees of Boston University (Boston, MA)

DOE Contract Number:: AC05-84OR21400

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: chemical; vapor; deposition; mullite; coatings; directed; creation; crystalline; uniform; microstructure; cvd; process; comprises; steps; establishing; flow; reactants; yield; reactor; depositing; coating; reactant; dense; thickness; uniform thickness; chemical vapor; vapor deposition; process comprises; reactant flow; mullite coatings; form microstructure; /427/

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                    Sarin, Vinod, and Mulpuri, Rao. Chemical vapor deposition of mullite coatings.  United States: N. p., 1998. 
        Web.

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                    Sarin, Vinod, & Mulpuri, Rao. Chemical vapor deposition of mullite coatings.  United States.

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                    Sarin, Vinod, and Mulpuri, Rao. Thu .  
        "Chemical vapor deposition of mullite coatings".  United States.  https://www.osti.gov/servlets/purl/871606.

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@article{osti_871606,

  title        = {Chemical vapor deposition of mullite coatings},

  author       = {Sarin, Vinod and Mulpuri, Rao},

  abstractNote = {This invention is directed to the creation of crystalline mullite coatings having uniform microstructure by chemical vapor deposition (CVD). The process comprises the steps of establishing a flow of reactants which will yield mullite in a CVD reactor, and depositing a crystalline coating from the reactant flow. The process will yield crystalline coatings which are dense and of uniform thickness.},

  doi          = {},

  url          = {https://www.osti.gov/biblio/871606},
  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1998},

  month        = {1}

}

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