Precision cleaning apparatus and method
- Albuquerque, NM
- Cedar Crest, NM
A precision cleaning apparatus and method. The precision cleaning apparatus includes a cleaning monitor further comprising an acoustic wave cleaning sensor such as a quartz crystal microbalance (QCM), a flexural plate wave (FPW) sensor, a shear horizontal acoustic plate mode (SH--APM) sensor, or a shear horizontal surface acoustic wave (SH--SAW) sensor; and measurement means connectable to the sensor for measuring in-situ one or more electrical response characteristics that vary in response to removal of one or more contaminants from the sensor and a workpiece located adjacent to the sensor during cleaning. Methods are disclosed for precision cleaning of one or more contaminants from a surface of the workpiece by means of the cleaning monitor that determines a state of cleanliness and any residual contamination that may be present after cleaning; and also for determining an effectiveness of a cleaning medium for removing one or more contaminants from a workpiece.
- Research Organization:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- DOE Contract Number:
- AC04-94AL85000
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Number(s):
- US 5706840
- OSTI ID:
- 871319
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
cleaning
apparatus
method
monitor
comprising
acoustic
wave
sensor
quartz
crystal
microbalance
qcm
flexural
plate
fpw
shear
horizontal
mode
sh-apm
surface
sh-saw
measurement
means
connectable
measuring
in-situ
electrical
response
characteristics
vary
removal
contaminants
workpiece
located
adjacent
methods
disclosed
determines
cleanliness
residual
contamination
determining
effectiveness
medium
removing
acoustic plate
flexural plate
plate wave
surface acoustic
acoustic wave
located adjacent
quartz crystal
cleaning apparatus
crystal microbalance
horizontal surface
plate mode
precision cleaning
response characteristic
electrical response
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