Microwave plasma monitoring system for the elemental composition analysis of high temperature process streams

Woskov, Paul P; Cohn, Daniel R; Titus, Charles H; Surma, Jeffrey E

Title: Microwave plasma monitoring system for the elemental composition analysis of high temperature process streams

Patent · Wed Jan 01 00:00:00 EST 1997

OSTI ID:871157

Woskov, Paul P ^[1]; Cohn, Daniel R ^[2]; Titus, Charles H ^[3]; Surma, Jeffrey E ^[4]

Bedford, MA
Chestnuthill, MA
Newtown Square, PA
Kennewick, WA

Microwave-induced plasma for continuous, real time trace element monitoring under harsh and variable conditions. The sensor includes a source of high power microwave energy and a shorted waveguide made of a microwave conductive, high temperature capability refractory material communicating with the source of the microwave energy to generate a plasma. The high power waveguide is constructed to be robust in a hot, hostile environment. It includes an aperture for the passage of gases to be analyzed and a spectrometer is connected to receive light from the plasma. Provision is made for real time in situ calibration. The spectrometer disperses the light, which is then analyzed by a computer. The sensor is capable of making continuous, real time quantitative measurements of desired elements, such as the heavy metals lead and mercury. The invention may be incorporated into a high temperature process device and implemented in situ for example, such as with a DC graphite electrode plasma arc furnace. The invention further provides a system for the elemental analysis of process streams by removing particulate and/or droplet samples therefrom and entraining such samples in the gas flow which passes through the plasma flame. Introduction of and entraining samples in the gas flow may be facilitated by a suction pump, regulating gas flow, gravity or combinations thereof.

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Research Organization:: Pacific Northwest National Laboratory (PNNL), Richland, WA (United States)

DOE Contract Number:: AC06-76RL01830

Assignee:: Masachusetts Institute of Technology (Cambridge, MA)

Patent Number(s):: US 5671045

OSTI ID:: 871157

Country of Publication:: United States

Language:: English

References (14)

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continuous
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Title: Microwave plasma monitoring system for the elemental composition analysis of high temperature process streams

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References (14)

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