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Title: Fluorine-containing composition for forming anti-reflection film on resist surface and pattern formation method

Abstract

A composition for forming anti-reflection film on resist surface which comprises an aqueous solution of a water soluble fluorine compound, and a pattern formation method which comprises the steps of coating a photoresist composition on a substrate; coating the above-mentioned composition for forming anti-reflection film; exposing the coated film to form a specific pattern; and developing the photoresist, are provided. Since the composition for forming anti-reflection film can be coated on the photoresist in the form of an aqueous solution, not only the anti-reflection film can be formed easily, but also, the film can be removed easily by rinsing with water or alkali development. Therefore, by the pattern formation method according to the present invention, it is possible to form a pattern easily with a high dimensional accuracy.

Inventors:
 [1];  [1]
  1. (Kitakyushu, JP)
Publication Date:
Research Org.:
BATTELLE MEMORIAL INSTITUTE
OSTI Identifier:
870405
Patent Number(s):
US 5514526
Assignee:
Mitsubishi Chemical Corporation (Tokyo, JP) PNNL
DOE Contract Number:
AC06-76RL01830
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
fluorine-containing; composition; forming; anti-reflection; film; resist; surface; pattern; formation; method; comprises; aqueous; solution; water; soluble; fluorine; compound; steps; coating; photoresist; substrate; above-mentioned; exposing; coated; form; specific; developing; provided; formed; easily; removed; rinsing; alkali; according; dimensional; accuracy; anti-reflection film; water soluble; aqueous solution; photoresist composition; pattern formation; method according; forming anti-reflection; resist surface; dimensional accuracy; /430/524/

Citation Formats

Nishi, Mineo, and Makishima, Hideo. Fluorine-containing composition for forming anti-reflection film on resist surface and pattern formation method. United States: N. p., 1996. Web.
Nishi, Mineo, & Makishima, Hideo. Fluorine-containing composition for forming anti-reflection film on resist surface and pattern formation method. United States.
Nishi, Mineo, and Makishima, Hideo. Mon . "Fluorine-containing composition for forming anti-reflection film on resist surface and pattern formation method". United States. doi:. https://www.osti.gov/servlets/purl/870405.
@article{osti_870405,
title = {Fluorine-containing composition for forming anti-reflection film on resist surface and pattern formation method},
author = {Nishi, Mineo and Makishima, Hideo},
abstractNote = {A composition for forming anti-reflection film on resist surface which comprises an aqueous solution of a water soluble fluorine compound, and a pattern formation method which comprises the steps of coating a photoresist composition on a substrate; coating the above-mentioned composition for forming anti-reflection film; exposing the coated film to form a specific pattern; and developing the photoresist, are provided. Since the composition for forming anti-reflection film can be coated on the photoresist in the form of an aqueous solution, not only the anti-reflection film can be formed easily, but also, the film can be removed easily by rinsing with water or alkali development. Therefore, by the pattern formation method according to the present invention, it is possible to form a pattern easily with a high dimensional accuracy.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Jan 01 00:00:00 EST 1996},
month = {Mon Jan 01 00:00:00 EST 1996}
}

Patent:

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