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Title: Method for accurate growth of vertical-cavity surface-emitting lasers

Patent ·
OSTI ID:869790

We report a method for accurate growth of vertical-cavity surface-emitting lasers (VCSELs). The method uses a single reflectivity spectrum measurement to determine the structure of the partially completed VCSEL at a critical point of growth. This information, along with the extracted growth rates, allows imprecisions in growth parameters to be compensated for during growth of the remaining structure, which can then be completed with very accurate critical dimensions. Using this method, we can now routinely grow lasing VCSELs with Fabry-Perot cavity resonance wavelengths controlled to within 0.5%.

Research Organization:
AT&T
DOE Contract Number:
AC04-76DP00789
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Number(s):
US 5397739
OSTI ID:
869790
Country of Publication:
United States
Language:
English

References (4)

Real‐time optical diagnostics for epitaxial growth
  • Aspnes, D. E.; Quinn, W. E.; Gregory, S.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 9, Issue 3 https://doi.org/10.1116/1.577332
journal May 1991
Molecular beam epitaxy growth of vertical cavity optical devices with in situ corrections journal September 1992
Diffuse optical reflectivity measurements on GaAs during molecular‐beam epitaxy processing
  • Lavoie, C.; Johnson, S. R.; Mackenzie, J. A.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 10, Issue 4 https://doi.org/10.1116/1.577880
journal July 1992
Method for accurate growth of vertical‐cavity surface‐emitting lasers journal March 1993