Magnetron sputtered boron films and Ti/B multilayer structures

Patent · Sun Jan 01 00:00:00 EST 1995

OSTI ID:869748

Makowiecki, Daniel M ^[1]; Jankowski, Alan F ^[1]

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1. Livermore, CA

A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor deposition processes. Magnetron sputter deposition method requires the use of a high density crystalline boron sputter target which is prepared by hot isostatic pressing. Thin boron films prepared by this method are useful for ultra-thin band pass filters as well as the low Z element in low Z/high Z mirrors which enhance reflectivity from grazing to normal incidence.

• Research Organization: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
• DOE Contract Number: W-7405-ENG-48
• Assignee: Regents of University of California (Oakland, CA)
• Patent Number(s): US 5389445
• OSTI ID: 869748
• Country of Publication: United States
• Language: English

Related Subjects

magnetron
sputtered
boron
films
multilayer
structures
method
described
production
titanium
sputter
deposition
amorphous
contain
morphological
growth
features
unlike
found
prepared
various
physical
vapor
processes
requires
density
crystalline
target
hot
isostatic
pressing
useful
ultra-thin
band
pass
filters
z
element
mirrors
enhance
reflectivity
grazing
normal
incidence
normal incidence
magnetron sputter
pass filters
morphological growth
multilayer structures
amorphous boron
band pass
deposition method
sputter deposition
boron films
vapor deposition
deposition process
hot isostatic
physical vapor
isostatic pressing
deposition processes
sputter target
pass filter
multilayer structure
sputtered boron
method requires
z element
ultra-thin band
various physical
growth features
crystalline boron
density crystalline
boron sputter
films prepared
enhance reflectivity
films contain
magnetron sputtered
sputter deposit
/428/359/