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Title: Photochemical cutting of fabrics

Abstract

Apparatus for the cutting of garment patterns from one or more layers of fabric. A laser capable of producing laser light at an ultraviolet wavelength is utilized to shine light through a pattern, such as a holographic phase filter, and through a lens onto the one or more layers of fabric. The ultraviolet laser light causes rapid photochemical decomposition of the one or more layers of fabric, but only along the pattern. The balance of the fabric of the one or more layers of fabric is undamaged.

Inventors:
 [1]
  1. (Los Alamos, NM)
Publication Date:
Research Org.:
Los Alamos National Laboratory (LANL), Los Alamos, NM
OSTI Identifier:
869617
Patent Number(s):
US 5367141
Assignee:
United States of America as represented by United States (Washington, DC) LANL
DOE Contract Number:
W-7405-ENG-36
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
photochemical; cutting; fabrics; apparatus; garment; patterns; layers; fabric; laser; capable; producing; light; ultraviolet; wavelength; utilized; shine; pattern; holographic; phase; filter; lens; causes; rapid; decomposition; balance; undamaged; laser light; ultraviolet laser; ultraviolet wavelength; producing laser; rapid ph; laser capable; /219/

Citation Formats

Piltch, Martin S. Photochemical cutting of fabrics. United States: N. p., 1994. Web.
Piltch, Martin S. Photochemical cutting of fabrics. United States.
Piltch, Martin S. Sat . "Photochemical cutting of fabrics". United States. doi:. https://www.osti.gov/servlets/purl/869617.
@article{osti_869617,
title = {Photochemical cutting of fabrics},
author = {Piltch, Martin S.},
abstractNote = {Apparatus for the cutting of garment patterns from one or more layers of fabric. A laser capable of producing laser light at an ultraviolet wavelength is utilized to shine light through a pattern, such as a holographic phase filter, and through a lens onto the one or more layers of fabric. The ultraviolet laser light causes rapid photochemical decomposition of the one or more layers of fabric, but only along the pattern. The balance of the fabric of the one or more layers of fabric is undamaged.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Sat Jan 01 00:00:00 EST 1994},
month = {Sat Jan 01 00:00:00 EST 1994}
}

Patent:

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