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Title: Photochemical cutting of fabrics

Abstract

Apparatus for the cutting of garment patterns from one or more layers of fabric. A laser capable of producing laser light at an ultraviolet wavelength is utilized to shine light through a pattern, such as a holographic phase filter, and through a lens onto the one or more layers of fabric. The ultraviolet laser light causes rapid photochemical decomposition of the one or more layers of fabric, but only along the pattern. The balance of the fabric of the one or more layers of fabric is undamaged.

Inventors:
 [1]
  1. (Los Alamos, NM)
Publication Date:
Research Org.:
Los Alamos National Laboratory (LANL), Los Alamos, NM
OSTI Identifier:
869617
Patent Number(s):
US 5367141
Assignee:
United States of America as represented by United States (Washington, DC) LANL
DOE Contract Number:
W-7405-ENG-36
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
photochemical; cutting; fabrics; apparatus; garment; patterns; layers; fabric; laser; capable; producing; light; ultraviolet; wavelength; utilized; shine; pattern; holographic; phase; filter; lens; causes; rapid; decomposition; balance; undamaged; laser light; ultraviolet laser; ultraviolet wavelength; producing laser; rapid ph; laser capable; /219/

Citation Formats

Piltch, Martin S. Photochemical cutting of fabrics. United States: N. p., 1994. Web.
Piltch, Martin S. Photochemical cutting of fabrics. United States.
Piltch, Martin S. 1994. "Photochemical cutting of fabrics". United States. doi:. https://www.osti.gov/servlets/purl/869617.
@article{osti_869617,
title = {Photochemical cutting of fabrics},
author = {Piltch, Martin S.},
abstractNote = {Apparatus for the cutting of garment patterns from one or more layers of fabric. A laser capable of producing laser light at an ultraviolet wavelength is utilized to shine light through a pattern, such as a holographic phase filter, and through a lens onto the one or more layers of fabric. The ultraviolet laser light causes rapid photochemical decomposition of the one or more layers of fabric, but only along the pattern. The balance of the fabric of the one or more layers of fabric is undamaged.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = 1994,
month = 1
}

Patent:

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  • Apparatus is described for the cutting of garment patterns from one or more layers of fabric. A laser capable of producing laser light at an ultraviolet wavelength is utilized to shine light through a pattern, such as a holographic phase filter, and through a lens onto the one or more layers of fabric. The ultraviolet laser light causes rapid photochemical decomposition of the one or more layers of fabric, but only along the pattern. The balance of the fabric of the one or more layers of fabric is undamaged. 1 fig.
  • To apply hard cutting particles, for example of tungsten carbide, on the surface of the cutting edge of a cutting tool, such as a saw blade, a drill, or the like, the cutting edge is partially melted by an energy beam, for example a laser beam, or an electron beam. A laser beam is preferred since, then, the process can be carried out in air, or in a protective gas atmosphere, rather than in a vacuum. The beam partially melts the cutting edge and the granules of the hard metal particles, preferably in a random grain size of between 0.3more » to 1.5 mm is permitted to run down, over the partially melted surface, excess being collected for reuse; alternatively, the partially melted surface can be dipped into the granules, and permitted to solidify.« less
  • Fibers, and fabrics produced from the fibers, are made water repellent, fire-retardant and/or thermally insulating by filling void spaces in the fibers and/or fabrics with a powdered material. When the powder is sufficiently finely divided, it clings tenaciously to the fabric's fibers and to itself, resisting the tendency to be removed from the fabric.
  • A process is given for improving the dyeability and hygroscopicity of fibers, fabrics, films, and molded articles made from synthetic high polymers. The process comprises irradiating the polymeric products with 10/sup 4/ to 10/sup 7/ r in the presence of certain heterocyclic compounds having three atoms in the heterocyclic ring. Some of the heterocyclic compounds which may be used are ethylene oxide, ethylene sulfide, ethylene imine, epichiorhydrin, propylene oxide, etc. (D.L.C.)