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Title: Determination of interfacial states in solid heterostructures using a variable-energy positron beam

Patent ·
OSTI ID:868733

A method and means is provided for characterizing interfacial electron states in solid heterostructures using a variable energy positron beam to probe the solid heterostructure. The method includes the steps of directing a positron beam having a selected energy level at a point on the solid heterostructure so that the positron beam penetrates into the solid heterostructure and causes positrons to collide with the electrons at an interface of the solid heterostructure. The number and energy of gamma rays emitted from the solid heterostructure as a result of the annihilation of positrons with electrons at the interface are detected. The data is quantified as a function of the Doppler broadening of the photopeak about the 511 keV line created by the annihilation of the positrons and electrons at the interface, preferably, as an S-parameter function; and a normalized S-parameter function of the data is obtained. The function of data obtained is compared with a corresponding function of the Doppler broadening of the annihilation photopeak about 511 keV for a positron beam having a second energy level directed at the same material making up a portion of the solid heterostructure. The comparison of these functions facilitates characterization of the interfacial states of electrons in the solid heterostructure at points corresponding to the penetration of positrons having the particular energy levels into the interface of the solid heterostructure. Accordingly, the invention provides a variable-energy non-destructive probe of solid heterostructures, such as SiO.sub.2 /Si, MOS or other semiconductor devices.

Research Organization:
Associated Universities, Inc., Upton, NY (United States)
DOE Contract Number:
AC02-76CH00016
Assignee:
Associated Universities, Inc. (Washington, DC)
Patent Number(s):
US 5200619
OSTI ID:
868733
Country of Publication:
United States
Language:
English

References (12)

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Reversible interaction of hydrogen with thin layers of thermally grown silicon dioxide journal June 1988
An investigation of the influence of low-temperature annealing treatments on the interface state density at the Si-SiO 2 journal September 1975
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Implantation profile of low‐energy positrons in solids journal October 1990
Microvoids at the SiO 2 /Si interface journal July 1989
Interaction of positron beams with surfaces, thin films, and interfaces journal July 1988
Interface state behaviour of plasma grown oxides following low temperature annealing journal October 1989
Defects and Impurities at the Si/Si(100) Interface Studied with Monoenergetic Positrons journal July 1988
SiO 2 /Si interface probed with a variable‐energy positron beam journal September 1987
Hydrogen interaction with oxidized Si(111) probed with positrons journal August 1989

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