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Title: Analysis of radiofrequency discharges in plasma

Patent ·
OSTI ID:868417
 [1];  [1]
  1. Baton Rouge, LA
+ Show Author Affiliations

Separation of laser optogalvanic signals in plasma into two components: (1) an ionization rate change component, and (2) a photoacoustic mediated component. This separation of components may be performed even when the two components overlap in time, by measuring time-resolved laser optogalvanic signals in an rf discharge plasma as the rf frequency is varied near the electrical resonance peak of the plasma and associated driving/detecting circuits. A novel spectrometer may be constructed to make these measurements. Such a spectrometer would be useful in better understanding and controlling such processes as plasma etching and plasma deposition.

Research Organization:
Louisiana State Univ., Baton Rouge, LA
DOE Contract Number:
FG05-87ER60503
Assignee:
Board of Supervisors of Louisiana State University and Agricultural and (Baton Rouge, LA)
Patent Number(s):
US 5135604
OSTI ID:
868417
Country of Publication:
United States
Language:
English

References (4)

Photoacoustics using radio-frequency laser-optogalvanic detection: a new technique for low-pressure photoacoustic spectroscopy. Magnetic predissociation of the state of I 2 journal September 1986
Time-resolved study of the laser optogalvanic effect in I2 journal April 1983
Time‐resolved laser optogalvanic spectroscopy of iodine in a radio frequency discharge journal April 1989
Temporal variation of electron density in a laser-perturbed discharge plasma and its relationship to the optogalvanic signal journal March 1984

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Analysis of radiofrequency discharges in plasma
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Temporal and spectral characteristics of laser optogalvanic signals in an argon rf discharge
Journal Article · Tue Dec 01 00:00:00 EST 1992 · Bulletin of the American Physical Society · OSTI ID:868417
Role of photoacoustics in optogalvanics
Journal Article · Sat Sep 15 00:00:00 EDT 1990 · Journal of Chemical Physics; (USA) · OSTI ID:868417

Related Subjects

analysis
radiofrequency
discharges
plasma
separation
laser
optogalvanic
signals
components
ionization
rate
change
component
photoacoustic
mediated
performed
overlap
time
measuring
time-resolved
rf
discharge
frequency
varied
near
electrical
resonance
peak
associated
driving
detecting
circuits
novel
spectrometer
constructed
measurements
useful
understanding
controlling
processes
etching
deposition
plasma etching
plasma deposition
discharge plasma
plasma etch
electrical resonance
measuring time
change component
resonance peak
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