Process for preparation of a seed layer for selective metal deposition
Patent
·
OSTI ID:868202
- Berkeley, CA
Disclosed is a process for selective metal deposition comprising of the steps of: a. formation of an initial surface on a substrate, said initial surface being comprised of at least two layers of which the uppermost is inert, b. exposing the surface to a source of heat in pre-determined places wherein surface activation is desired, and c. deposition of metal on activated portions of said surface.
- Research Organization:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA
- DOE Contract Number:
- W-7405-ENG-48
- Assignee:
- United States of America as represented by United States (Washington, DC)
- Patent Number(s):
- US 5098526
- OSTI ID:
- 868202
- Country of Publication:
- United States
- Language:
- English
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activated
activated portion
activation
comprised
comprising
deposition
desired
disclosed
exposing
formation
heat
inert
initial
initial surface
layer
layers
metal
metal deposit
metal deposition
portions
pre-determined
preparation
process
seed
seed layer
selective
selective metal
source
steps
substrate
surface
uppermost
activated
activated portion
activation
comprised
comprising
deposition
desired
disclosed
exposing
formation
heat
inert
initial
initial surface
layer
layers
metal
metal deposit
metal deposition
portions
pre-determined
preparation
process
seed
seed layer
selective
selective metal
source
steps
substrate
surface
uppermost