Process for removal of water and silicon mu-oxides from chlorosilanes

Patent · 10 March 1992

OSTI ID:868186

Tom, Glenn M ^[1]; McManus, James V ^[2]

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1. New Milford, CT
2. Danbury, CT

A scavenger composition having utility for removal of water and silicon mu-oxide impurities from chlorosilanes, such scavenger composition comprising: (a) a support; and (b) associated with the support, one or more compound(s) selected from the group consisting of compounds of the formula: R.sub.a-x MCl.sub.x wherein: M is a metal selected from the group consisting of the monovalent metals lithium, sodium, and potassium; the divalent metals magnesium, strontium, barium, and calcium; and the trivalent metal aluminum; R is alkyl; a is a number equal to the valency of metal M; and x is a number having a value of from 0 to a, inclusive; and wherein said compound(s) of the formula R.sub.a-x MCl.sub.x have been activated for impurity-removal service by a reaction scheme selected from those of the group consisting of: (i) reaction of such compound(s) with hydrogen chloride to form a first reaction product therefrom, followed by reaction of the first reaction product with a chlorosilane of the formula: SiH.sub.4-y Cl.sub.y, wherein y is a number having a value of from 1 to 3, inclusive; and (ii) reaction of such compound(s) with a chlorosilane of the formula: SiH.sub.4-y Cl.sub.y wherein y is a number having a value of 1 to 3, inclusive. A corresponding method of making the scavenger composition, and of purifying a chlorosilane which contains oxygen and silicon mu-oxide impurities, likewise are disclosed, together with a purifier apparatus, in which a bed of the scavenger composition is disposed. The composition, purification process, and purifier apparatus of the invention have utility in purifying gaseous chlorosilanes which are employed in the semiconductor industry as silicon source reagents for forming epitaxial silicon layers.

• Research Organization: ADVANCED TECHNOLOGY MATERIALS
• DOE Contract Number: AC01-87ER80469
• Assignee: Novapure Corporation (Danbury, CT)
• Patent Number(s): US 5094830
• Application Number: 07/737,181
• OSTI ID: 868186
• Country of Publication: United States
• Language: English

Related Subjects

/423/95/252/502/
4-y
a-x
activated
alkyl
aluminum
apparatus
associated
barium
bed
calcium
chloride
chlorosilane
chlorosilanes
composition
composition comprising
compound
compounds
comprising
consisting
contains
contains oxygen
corresponding
corresponding method
disclosed
disposed
divalent
divalent metal
divalent metals
employed
epitaxial
epitaxial silicon
equal
followed
form
forming
forming epitaxial
formula
gaseous
hydrogen
hydrogen chloride
ii
impurities
impurity-removal
inclusive
industry
layers
likewise
lithium
magnesium
mcl
metal
metal aluminum
metal selected
metals
method
monovalent
monovalent metals
mu-oxide
mu-oxide impurities
mu-oxides
oxide impurities
oxygen
potassium
process
product
product therefrom
purification
purification process
purifier
purifying
reaction
reaction product
reaction scheme
reagents
removal
scavenger
scavenger composition
scheme
selected
semiconductor
service
sih
silicon
silicon layer
silicon layers
silicon mu-oxide
silicon mu-oxides
silicon source
sodium
source
strontium
support
therefrom
trivalent
trivalent metal
utility
valency
value
water