Coated substrates and process

Patent · Tue Jan 01 00:00:00 EST 1991

OSTI ID:868074

Chu, Wei-kan ^[1]; Childs, Charles B ^[1]

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1. Chapel Hill, NC

Disclosed herein is a coated substrate and a process for forming films on substrates and for providing a particularly smooth film on a substrate. The method of this invention involves subjecting a surface of a substrate to contact with a stream of ions of an inert gas having sufficient force and energy to substantially change the surface characteristics of said substrate, and then exposing a film-forming material to a stream of ions of an inert gas having sufficient energy to vaporize the atoms of said film-forming material and to transmit the vaporized atoms to the substrate surface with sufficient force to form a film bonded to the substrate. This process is particularly useful commercially because it forms strong bonds at room temperature. This invention is particularly useful for adhering a gold film to diamond and forming ohmic electrodes on diamond, but also can be used to bond other films to substrates.

• Assignee: University of North Carolina at Chapel Hill (Chapel Hill, NC)
• Patent Number(s): US 5068020
• OSTI ID: 868074
• Country of Publication: United States
• Language: English

Related Subjects

coated
substrates
process
disclosed
substrate
forming
films
providing
particularly
smooth
film
method
involves
subjecting
surface
contact
stream
inert
gas
sufficient
force
energy
substantially
change
characteristics
exposing
film-forming
material
vaporize
atoms
transmit
vaporized
form
bonded
useful
commercially
forms
strong
bonds
temperature
adhering
gold
diamond
ohmic
electrodes
bond
strong bond
coated substrates
sufficient energy
particularly useful
inert gas
substrate surface
coated substrate
surface characteristics
process disclosed
ohmic electrode
forming material
sufficient force
film bonded
strong bonds
involves subjecting
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