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Title: Selective protection of poly(tetra-fluoroethylene) from effects of chemical etching

Abstract

A photolithographic method for treating an article formed of polymeric material comprises subjecting portions of a surface of the polymeric article to ionizing radiation; and then subjecting the surface to chemical etching. The ionizing radiation treatment according to the present invention minimizes the effect of the subseuent chemical etching treatment. Thus, selective protection from the effects of chemical etching can be easily provided. The present invention has particular applicability to articles formed of fluorocarbons, such as PTFE. The ionizing radiation employed in the method may comprise Mg(k.alpha.) X-rays or lower-energy electrons.

Inventors:
 [1];  [1]
  1. Albuquerque, NM
Publication Date:
Research Org.:
AT & T CORP
OSTI Identifier:
868069
Patent Number(s):
US 5066565
Assignee:
United States of America as represented by United States (Washington, DC)
DOE Contract Number:  
AC04-76DP00789
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
selective; protection; poly; tetra-fluoroethylene; effects; chemical; etching; photolithographic; method; treating; article; formed; polymeric; material; comprises; subjecting; portions; surface; ionizing; radiation; treatment; according; minimizes; effect; subseuent; easily; provided; particular; applicability; articles; fluorocarbons; ptfe; employed; comprise; mg; alpha; x-rays; lower-energy; electrons; energy electrons; chemical etching; polymeric material; ionizing radiation; material comprises; energy electron; polymeric article; articles formed; comprises subjecting; /430/216/

Citation Formats

Martinez, Robert J, and Rye, Robert R. Selective protection of poly(tetra-fluoroethylene) from effects of chemical etching. United States: N. p., 1991. Web.
Martinez, Robert J, & Rye, Robert R. Selective protection of poly(tetra-fluoroethylene) from effects of chemical etching. United States.
Martinez, Robert J, and Rye, Robert R. Tue . "Selective protection of poly(tetra-fluoroethylene) from effects of chemical etching". United States. https://www.osti.gov/servlets/purl/868069.
@article{osti_868069,
title = {Selective protection of poly(tetra-fluoroethylene) from effects of chemical etching},
author = {Martinez, Robert J and Rye, Robert R},
abstractNote = {A photolithographic method for treating an article formed of polymeric material comprises subjecting portions of a surface of the polymeric article to ionizing radiation; and then subjecting the surface to chemical etching. The ionizing radiation treatment according to the present invention minimizes the effect of the subseuent chemical etching treatment. Thus, selective protection from the effects of chemical etching can be easily provided. The present invention has particular applicability to articles formed of fluorocarbons, such as PTFE. The ionizing radiation employed in the method may comprise Mg(k.alpha.) X-rays or lower-energy electrons.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1991},
month = {1}
}

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