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Title: Method of processing materials using an inductively coupled plasma

Abstract

A method for making fine power using an inductively coupled plasma. The method provides a gas-free environment, since the plasma is formed without using a gas. The starting material used in the method is in solid form.

Inventors:
 [1];  [1]
  1. (Los Alamos, NM)
Publication Date:
Research Org.:
Los Alamos National Laboratory (LANL), Los Alamos, NM
OSTI Identifier:
867259
Patent Number(s):
US 4897579
Assignee:
United States of America as represented by United States (Washington, DC) LANL
DOE Contract Number:  
W-7405-ENG-36
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
method; processing; materials; inductively; coupled; plasma; fine; power; provides; gas-free; environment; formed; gas; starting; material; solid; form; solid form; starting material; inductively coupled; coupled plasma; method provides; method provide; processing materials; gas-free environment; /315/219/313/

Citation Formats

Hull, Donald E., and Bieniewski, Thomas M. Method of processing materials using an inductively coupled plasma. United States: N. p., 1990. Web.
Hull, Donald E., & Bieniewski, Thomas M. Method of processing materials using an inductively coupled plasma. United States.
Hull, Donald E., and Bieniewski, Thomas M. Mon . "Method of processing materials using an inductively coupled plasma". United States. https://www.osti.gov/servlets/purl/867259.
@article{osti_867259,
title = {Method of processing materials using an inductively coupled plasma},
author = {Hull, Donald E. and Bieniewski, Thomas M.},
abstractNote = {A method for making fine power using an inductively coupled plasma. The method provides a gas-free environment, since the plasma is formed without using a gas. The starting material used in the method is in solid form.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1990},
month = {1}
}

Patent:

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