Thin film coating process using an inductively coupled plasma

Patent · Tue Jan 30 00:00:00 EST 1990

OSTI ID:867256

Kniseley, Richard N ^[1]; Schmidt, Frederick A ^[1]; Merkle, Brian D ^[1]

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1. Ames, IA

Thin coatings of normally solid materials are applied to target substrates using an inductively coupled plasma. Particles of the coating material are vaporized by plasma heating, and pass through an orifice to a first vacuum zone in which the particles are accelerated to a velocity greater than Mach 1. The shock wave generated in the first vacuum zone is intercepted by the tip of a skimmer cone that provides a second orifice. The particles pass through the second orifice into a second zone maintained at a higher vacuum and impinge on the target to form the coating. Ultrapure coatings can be formed.

• Research Organization: Ames Laboratory (AMES), Ames, IA; Iowa State Univ., Ames, IA (United States)
• DOE Contract Number: W-7405-ENG-82
• Assignee: Iowa State University Reserach Foundation, Inc. (Ames, IA)
• Patent Number(s): US 4897282
• Application Number: 07/199,286
• OSTI ID: 867256
• Country of Publication: United States
• Language: English

Related Subjects

film
coating
process
inductively
coupled
plasma
coatings
normally
solid
materials
applied
target
substrates
particles
material
vaporized
heating
pass
orifice
vacuum
zone
accelerated
velocity
mach
shock
wave
generated
intercepted
tip
skimmer
cone
provides
maintained
impinge
form
ultrapure
formed
zone maintained
coating material
solid materials
inductively coupled
shock wave
solid material
coupled plasma
film coating
target substrate
normally solid
coating process
particles pass
plasma heating
wave generated
target substrates
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