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Title: Scanning tunneling microscope nanoetching method

Abstract

A method is described for forming uniform nanometer sized depressions on the surface of a conducting substrate. A tunneling tip is used to apply tunneling current density sufficient to vaporize a localized area of the substrate surface. The resulting depressions or craters in the substrate surface can be formed in information encoding patterns readable with a scanning tunneling microscope.

Inventors:
 [1];  [1];  [1]
  1. (West Lafayette, IN)
Publication Date:
Research Org.:
Purdue Research Foundation (West Lafayette, IN)
OSTI Identifier:
867251
Patent Number(s):
US 4896044
Assignee:
Purdue Research Foundation (West Lafayette, IN) CHO
DOE Contract Number:  
FG02-84ER45162
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
scanning; tunneling; microscope; nanoetching; method; described; forming; uniform; nanometer; sized; depressions; surface; conducting; substrate; tip; apply; current; density; sufficient; vaporize; localized; resulting; craters; formed; information; encoding; patterns; readable; scanning tunneling; tunneling microscope; current density; substrate surface; nanometer size; tunneling current; forming uniform; etching method; conducting substrate; density sufficient; /250/216/347/369/

Citation Formats

Li, Yun-Zhong, Reifenberger, Ronald G., and Andres, Ronald P. Scanning tunneling microscope nanoetching method. United States: N. p., 1990. Web.
Li, Yun-Zhong, Reifenberger, Ronald G., & Andres, Ronald P. Scanning tunneling microscope nanoetching method. United States.
Li, Yun-Zhong, Reifenberger, Ronald G., and Andres, Ronald P. Mon . "Scanning tunneling microscope nanoetching method". United States. https://www.osti.gov/servlets/purl/867251.
@article{osti_867251,
title = {Scanning tunneling microscope nanoetching method},
author = {Li, Yun-Zhong and Reifenberger, Ronald G. and Andres, Ronald P.},
abstractNote = {A method is described for forming uniform nanometer sized depressions on the surface of a conducting substrate. A tunneling tip is used to apply tunneling current density sufficient to vaporize a localized area of the substrate surface. The resulting depressions or craters in the substrate surface can be formed in information encoding patterns readable with a scanning tunneling microscope.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1990},
month = {1}
}

Patent:

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