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Title: Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequency electromagnetic waves

Abstract

An apparatus and method for creating high temperature plasmas for enhanced chemical processing of gaseous fluids, toxic chemicals, and the like, at a wide range of pressures, especially at atmospheric and high pressures includes an electro-magnetic resonator cavity, preferably a reentrant cavity, and a wave guiding structure which connects an electro-magnetic source to the cavity. The cavity includes an intake port and an exhaust port, each having apertures in the conductive walls of the cavity sufficient for the intake of the gaseous fluids and for the discharge of the processed gaseous fluids. The apertures are sufficiently small to prevent the leakage of the electro-magnetic radiation from the cavity. Gaseous fluid flowing from the direction of the electro-magnetic source through the guiding wave structure and into the cavity acts on the plasma to push it away from the guiding wave structure and the electro-magnetic source. The gaseous fluid flow confines the high temperature plasma inside the cavity and allows complete chemical processing of the gaseous fluids at a wide range of pressures.

Inventors:
 [1];  [2]
  1. (Bedminister, NJ)
  2. (Flemington, NJ)
Publication Date:
Research Org.:
COTTRELL ENVIRONMENTAL SCIENCE
OSTI Identifier:
867193
Patent Number(s):
US 4883570
Application Number:
4883570
Assignee:
Research-Cottrell, Inc. (Somerville, NJ) OSTI
DOE Contract Number:  
AC22-85PC81002
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
apparatus; method; enhanced; chemical; processing; pressure; atmospheric; plasmas; produced; frequency; electromagnetic; waves; creating; temperature; gaseous; fluids; toxic; chemicals; wide; range; pressures; especially; electro-magnetic; resonator; cavity; preferably; reentrant; wave; guiding; structure; connects; source; intake; exhaust; apertures; conductive; walls; sufficient; discharge; processed; sufficiently; prevent; leakage; radiation; fluid; flowing; direction; plasma; push; flow; confines; inside; allows; complete; wave structure; enhanced chemical; magnetic wave; gaseous fluid; fluid flow; wide range; electromagnetic waves; electromagnetic wave; fluid flowing; chemical processing; toxic chemicals; chemical process; resonator cavity; temperature plasma; frequency electromagnetic; conductive walls; temperature plasmas; toxic chemical; /204/219/315/422/

Citation Formats

Efthimion, Philip C., and Helfritch, Dennis J. Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequency electromagnetic waves. United States: N. p., 1989. Web.
Efthimion, Philip C., & Helfritch, Dennis J. Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequency electromagnetic waves. United States.
Efthimion, Philip C., and Helfritch, Dennis J. Tue . "Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequency electromagnetic waves". United States. https://www.osti.gov/servlets/purl/867193.
@article{osti_867193,
title = {Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequency electromagnetic waves},
author = {Efthimion, Philip C. and Helfritch, Dennis J.},
abstractNote = {An apparatus and method for creating high temperature plasmas for enhanced chemical processing of gaseous fluids, toxic chemicals, and the like, at a wide range of pressures, especially at atmospheric and high pressures includes an electro-magnetic resonator cavity, preferably a reentrant cavity, and a wave guiding structure which connects an electro-magnetic source to the cavity. The cavity includes an intake port and an exhaust port, each having apertures in the conductive walls of the cavity sufficient for the intake of the gaseous fluids and for the discharge of the processed gaseous fluids. The apertures are sufficiently small to prevent the leakage of the electro-magnetic radiation from the cavity. Gaseous fluid flowing from the direction of the electro-magnetic source through the guiding wave structure and into the cavity acts on the plasma to push it away from the guiding wave structure and the electro-magnetic source. The gaseous fluid flow confines the high temperature plasma inside the cavity and allows complete chemical processing of the gaseous fluids at a wide range of pressures.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1989},
month = {11}
}

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