Amorphous silicon ionizing particle detectors
Abstract
Amorphous silicon ionizing particle detectors having a hydrogenated amorphous silicon (a--Si:H) thin film deposited via plasma assisted chemical vapor deposition techniques are utilized to detect the presence, position and counting of high energy ionizing particles, such as electrons, x-rays, alpha particles, beta particles and gamma radiation.
- Inventors:
-
- Palo Alto, CA
- Berkeley, CA
- El Cerrito, CA
- Publication Date:
- Research Org.:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- OSTI Identifier:
- 866778
- Patent Number(s):
- US 4785186
- Assignee:
- Xerox Corporation (Stamford, CT)
- DOE Contract Number:
- AC03-76SF00098
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- amorphous; silicon; ionizing; particle; detectors; hydrogenated; a-si; film; deposited; via; plasma; assisted; chemical; vapor; deposition; techniques; utilized; detect; presence; position; counting; energy; particles; electrons; x-rays; alpha; beta; gamma; radiation; plasma assisted; assisted chemical; particle detectors; chemical vapor; amorphous silicon; vapor deposition; hydrogenated amorphous; gamma radiation; alpha particle; alpha particles; particle detector; deposition techniques; beta particles; film deposited; deposition technique; silicon ionizing; energy ionizing; beta particle; ionizing particle; /250/257/
Citation Formats
Street, Robert A, Mendez, Victor P, and Kaplan, Selig N. Amorphous silicon ionizing particle detectors. United States: N. p., 1988.
Web.
Street, Robert A, Mendez, Victor P, & Kaplan, Selig N. Amorphous silicon ionizing particle detectors. United States.
Street, Robert A, Mendez, Victor P, and Kaplan, Selig N. 1988.
"Amorphous silicon ionizing particle detectors". United States. https://www.osti.gov/servlets/purl/866778.
@article{osti_866778,
title = {Amorphous silicon ionizing particle detectors},
author = {Street, Robert A and Mendez, Victor P and Kaplan, Selig N},
abstractNote = {Amorphous silicon ionizing particle detectors having a hydrogenated amorphous silicon (a--Si:H) thin film deposited via plasma assisted chemical vapor deposition techniques are utilized to detect the presence, position and counting of high energy ionizing particles, such as electrons, x-rays, alpha particles, beta particles and gamma radiation.},
doi = {},
url = {https://www.osti.gov/biblio/866778},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Fri Jan 01 00:00:00 EST 1988},
month = {Fri Jan 01 00:00:00 EST 1988}
}
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