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Title: Amorphous silicon ionizing particle detectors

Abstract

Amorphous silicon ionizing particle detectors having a hydrogenated amorphous silicon (a--Si:H) thin film deposited via plasma assisted chemical vapor deposition techniques are utilized to detect the presence, position and counting of high energy ionizing particles, such as electrons, x-rays, alpha particles, beta particles and gamma radiation.

Inventors:
 [1];  [2];  [3]
  1. (Palo Alto, CA)
  2. (Berkeley, CA)
  3. (El Cerrito, CA)
Publication Date:
Research Org.:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA
OSTI Identifier:
866778
Patent Number(s):
US 4785186
Assignee:
Xerox Corporation (Stamford, CT) LBNL
DOE Contract Number:  
AC03-76SF00098
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
amorphous; silicon; ionizing; particle; detectors; hydrogenated; a-si; film; deposited; via; plasma; assisted; chemical; vapor; deposition; techniques; utilized; detect; presence; position; counting; energy; particles; electrons; x-rays; alpha; beta; gamma; radiation; plasma assisted; assisted chemical; particle detectors; chemical vapor; amorphous silicon; vapor deposition; hydrogenated amorphous; gamma radiation; alpha particle; alpha particles; particle detector; deposition techniques; beta particles; film deposited; deposition technique; silicon ionizing; energy ionizing; beta particle; ionizing particle; /250/257/

Citation Formats

Street, Robert A., Mendez, Victor P., and Kaplan, Selig N.. Amorphous silicon ionizing particle detectors. United States: N. p., 1988. Web.
Street, Robert A., Mendez, Victor P., & Kaplan, Selig N.. Amorphous silicon ionizing particle detectors. United States.
Street, Robert A., Mendez, Victor P., and Kaplan, Selig N.. Fri . "Amorphous silicon ionizing particle detectors". United States. https://www.osti.gov/servlets/purl/866778.
@article{osti_866778,
title = {Amorphous silicon ionizing particle detectors},
author = {Street, Robert A. and Mendez, Victor P. and Kaplan, Selig N.},
abstractNote = {Amorphous silicon ionizing particle detectors having a hydrogenated amorphous silicon (a--Si:H) thin film deposited via plasma assisted chemical vapor deposition techniques are utilized to detect the presence, position and counting of high energy ionizing particles, such as electrons, x-rays, alpha particles, beta particles and gamma radiation.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Fri Jan 01 00:00:00 EST 1988},
month = {Fri Jan 01 00:00:00 EST 1988}
}

Patent:

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