Resistance probe for energetic particle dosimetry

Title: Resistance probe for energetic particle dosimetry

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Abstract

A probe for determining the energy and flux of particles in a plasma comprises a carbon film adapted to be exposed to the plasma, the film havinmg an electrical resistance which is related to the number of particles impacting the film, contacts for passing an electrical current through the film, and contacts for determining the electrical resistance of the film. An improved method for determining the energy or flux of particles in a plasma is also disclosed.

Inventors:

Wampler, William R ^[1]

Albuquerque, NM

Publication Date:: 1988-01-01

Research Org.:: AT&T

OSTI Identifier:: 866701

Patent Number(s):: US 4767591

Assignee:: United States of America as represented by Department of Energy (Washington, DC)

DOE Contract Number:: AC04-76DP00789

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: resistance; probe; energetic; particle; dosimetry; determining; energy; flux; particles; plasma; comprises; carbon; film; adapted; exposed; havinmg; electrical; related; impacting; contacts; passing; current; improved; method; disclosed; improved method; electrical resistance; electrical current; carbon film; plasma comprises; particles impact; /376/324/

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                    Wampler, William R. Resistance probe for energetic particle dosimetry.  United States: N. p., 1988. 
        Web.

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                    Wampler, William R. Resistance probe for energetic particle dosimetry.  United States.

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                    Wampler, William R. Fri .  
        "Resistance probe for energetic particle dosimetry".  United States.  https://www.osti.gov/servlets/purl/866701.

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@article{osti_866701,

  title        = {Resistance probe for energetic particle dosimetry},

  author       = {Wampler, William R},

  abstractNote = {A probe for determining the energy and flux of particles in a plasma comprises a carbon film adapted to be exposed to the plasma, the film havinmg an electrical resistance which is related to the number of particles impacting the film, contacts for passing an electrical current through the film, and contacts for determining the electrical resistance of the film. An improved method for determining the energy or flux of particles in a plasma is also disclosed.},

  doi          = {},

  url          = {https://www.osti.gov/biblio/866701},
  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1988},

  month        = {1}

}

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Resistance probe for energetic particle dosimetry

Patent Wampler, W R

A probe for determining the energy and flux of particles in a plasma comprises a carbon film adapted to be exposed to the plasma, the film having an electrical resistance which is related to the number of particles impacting the film, contacts for passing an electrical current throught the film, and contacts for determining the electrical resistance of the film. An improved method for determining the energy or flux of particles in a plasma is also disclosed.
Resistance probe for energetic particle dosimetry

Patent Wampler, W R

A probe is described for determining the energy and flux of particles in a plasma, comprising: a thin annealed carbon film adapted to be brought into contact with a plasma, the film having an electrical resistance which is related to the number of plasma particles impacting the film; means for passing an electrical current through the film; and means for determining the electrical resistance of the film to the current therethrough.
Resistance probe for energetic particle dosimetry with applications for plasma edge studies

Journal Article Wampler, W R - Appl. Phys. Lett.; (United States)

Changes in the electrical resistance of thin carbon films caused by implantation with hydrogen, deuterium, and carbon ions were measured for various incident energies and for particle fluences in the range from 10/sup 12/ to 10/sup 17/ at./cm/sup 2/. At low fluences the resistivity change is found to be proportional to the displacement damage caused by the incident particles. A model is presented which can be used to calculate the resistance change which is in good agreement with the measurements. It is proposed that by measuring the resistance change for carbon films exposed to the edge of magnetically confined plasmasmore »« less
https://doi.org/10.1063/1.93527
Plasma-edge studies using carbon resistance probes

Journal Article Wampler, W R - J. Vac. Sci. Technol., A; (United States)

Characterization of erosion and hydrogen-recycling processes occurring at the edge of magnetically confined plasmas requires knowledge of the energy and flux of hydrogen isotopes incident on the materials. A new plasma-edge probe technique, the carbon resistance probe, has been developed to obtain this information. This technique utilizes the increase in electrical resistance caused in thin carbon films by energetic particle bombardment to characterize the flux and energy of the incident ions and neutrals. The method is relatively easy to implement and gives data in real time. Energy resolution of low dose exposures has been achieved using thin insulating films overmore »« less
https://doi.org/10.1116/1.573119
Plasma edge studies using carbon resistance probes

Journal Article Wampler, W R ; Manos, D M - J. Vac. Sci. Technol., A; (United States)

A new experimental technique, the resistance probe, was used to study the plasma edge in the PLT and PDX tokamaks. This technique involves measuring the change in resistance of a thin carbon film due to bombardment by energetic particles escaping the plasma. The probes have been calibrated by measuring the resistance change caused by implantation of various ions at different energies. A model has been developed which can be used to determine the flux and energy of the incident particles from the measured resistance changes. For probes exposed in PDX and PLT near the wall, resistance changes were observed duemore »« less
https://doi.org/10.1116/1.572004

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