Axial flow plasma shutter

Patent · 01 January 1988

OSTI ID:866485

Krausse, George J ^[1]

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1. Fort Collins, CO

A shutter (36) is provided for controlling a beam, or current, of charged particles in a device such as a thyratron (10). The substrate (38) defines an aperture (60) with a gap (32) which is placeable within the current. Coils (48) are formed on the substrate (38) adjacent the aperture (60) to produce a magnetic field for trapping the charged particles in or about aperture (60). The proximity of the coils (48) to the aperture (60) enables an effective magnetic field to be generated by coils (48) having a low inductance suitable for high frequency control. The substantially monolithic structure including the substrate (38) and coils (48) enables the entire shutter assembly (36) to be effectively located with respect to the particle beam.

• Research Organization: Los Alamos National Laboratory (LANL), Los Alamos, NM
• DOE Contract Number: W-7405-ENG-36
• Assignee: Regents of University of California (Berkeley, CA)
• Patent Number(s): US 4721891
• OSTI ID: 866485
• Country of Publication: United States
• Language: English

Related Subjects

/315/313/
10
32
36
38
48
60
adjacent
aperture
assembly
axial
axial flow
beam
charged
charged particle
charged particles
coils
control
controlling
current
defines
device
effective
effectively
enables
entire
field
flow
formed
frequency
gap
generated
including
inductance
located
magnetic
magnetic field
monolithic
monolithic structure
particle
particle beam
particles
placeable
plasma
produce
provided
proximity
respect
shutter
structure
structure including
substantially
substrate
suitable
thyratron
trapping