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Title: Gas mixture for diffuse-discharge switch

Abstract

Gaseous medium in a diffuse-discharge switch of a high-energy pulse generator is formed of argon combined with a compound selected from the group consisting of CF.sub.4, C.sub.2 F.sub.6, C.sub.3 F.sub.8, n-C.sub.4 F.sub.10, WF.sub.6, (CF.sub.3).sub.2 S and (CF.sub.3).sub.2 O.

Inventors:
 [1];  [2];  [1]
  1. (Oak Ridge, TN)
  2. (Knoxville, TN)
Publication Date:
Research Org.:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN
OSTI Identifier:
865297
Patent Number(s):
US 4490650
Assignee:
United States of America as represented by United States (Washington, DC) ORNL
DOE Contract Number:
W-7405-ENG-26
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
gas; mixture; diffuse-discharge; switch; gaseous; medium; high-energy; pulse; generator; formed; argon; combined; compound; selected; consisting; cf; n-c; 10; wf; compound selected; pulse generator; gas mixture; gaseous medium; energy pulse; discharge switch; high-energy pulse; diffuse-discharge switch; /315/313/

Citation Formats

Christophorou, Loucas G., Carter, James G., and Hunter, Scott R.. Gas mixture for diffuse-discharge switch. United States: N. p., 1984. Web.
Christophorou, Loucas G., Carter, James G., & Hunter, Scott R.. Gas mixture for diffuse-discharge switch. United States.
Christophorou, Loucas G., Carter, James G., and Hunter, Scott R.. 1984. "Gas mixture for diffuse-discharge switch". United States. doi:. https://www.osti.gov/servlets/purl/865297.
@article{osti_865297,
title = {Gas mixture for diffuse-discharge switch},
author = {Christophorou, Loucas G. and Carter, James G. and Hunter, Scott R.},
abstractNote = {Gaseous medium in a diffuse-discharge switch of a high-energy pulse generator is formed of argon combined with a compound selected from the group consisting of CF.sub.4, C.sub.2 F.sub.6, C.sub.3 F.sub.8, n-C.sub.4 F.sub.10, WF.sub.6, (CF.sub.3).sub.2 S and (CF.sub.3).sub.2 O.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = 1984,
month = 1
}

Patent:

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  • A gas mixture is described comprising: a conducting gas that does not readily attach electrons; an insulating gas that readily attaches higher energy electrons; and a third gas having an ionization potential sufficiently low that it can release electrons upon collision with atoms of the conducting or insulating gas when in an excited electronic state; wherein the gases are present in suitable proportions to maximize current and maintain sufficient insulation properties to protect the switch from voltage damage.
  • A new diffuse discharge gas switch wherein a mixture of gases is used to take advantage of desirable properties of the respective gases. There is a conducting gas, an insulating gas, and a third gas that has low ionization energy resulting in a net increase in the number of electrons available to produce a current.
  • Gaseous medium in a diffuse-discharge switch of a high-energy pulse generator is formed of argon combined with a compound selected from the group consisting of CF/sub 4/, C/sub 2/F/sub 6/, C/sub 3/F/sub 8/, n-C/sub 4/F/sub 10/, WF/sub 6/, (CF/sub 3/)/sub 2/S and (CF/sub 3/)/sub 2/O.
  • Gaseous medium in a diffuse-discharge switch of a high-energy pulse generator is formed of argon combined with a compound selected from the group consisting of CF/sub 4/, C/sub 2/F/sub 6/, C/sub 3/F/sub 8/, n-C/sub 4/F/sub 10/, WF/sub 6/, (CF/sub 3/)/sub 2/S and (CF/sub 3/)/sub 2/O.
  • The invention is a gas mixture for a diffuse discharge switch which is capable of changing from a conducting state to an insulating state in the presence of electrons upon the introduction of laser light. The mixture is composed of a buffer gas such as nitrogen or argon and an electron attaching gas such as C.sub.6 H.sub.5 SH, C.sub.6 H.sub.5 SCH.sub.3, CH.sub.3 CHO and CF.sub.3 CHO wherein the electron attachment is brought on by indirect excitation of molecules to long-lived states by exposure to laser light.