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Title: Method and apparatus for producing high purity silicon

Patent ·
OSTI ID:865242

A method for producing high purity silicon includes forming a copper silie alloy and positioning the alloy within an enclosure. A filament member is also placed within the enclosure opposite the alloy. The enclosure is then filled with a chemical vapor transport gas adapted for transporting silicon. Finally, both the filament member and the alloy are heated to temperatures sufficient to cause the gas to react with silicon at the alloy surface and deposit the reacted silicon on the filament member. In addition, an apparatus for carrying out this method is also disclosed.

Research Organization:
National Renewable Energy Laboratory (NREL), Golden, CO (United States)
DOE Contract Number:
EG-77-C-01-4042
Assignee:
United States of America as represented by Department of Energy (Washington, DC)
Patent Number(s):
US 4481232
OSTI ID:
865242
Country of Publication:
United States
Language:
English