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Title: Deposited films with improved microstructures

Abstract

Methods for improving microstructures of line-of-sight deposited films are described. Columnar growth defects ordinarily produced by geometrical shadowing during deposition of such films are eliminated without resorting to post-deposition thermal or mechanical treatments. The native, as-deposited coating qualities, including homogeneity, fine grain size, and high coating-to-substrate adherence, can thus be retained. The preferred method includes the steps of emitting material from a source toward a substrate to deposit a coating non-uniformly on the substrate surface, removing a portion of the coating uniformly over the surface, again depositing material onto the surface, but from a different direction, and repeating the foregoing steps. The quality of line-of-sight deposited films such as those produced by sputtering, progressively deteriorates as the angle of incidence between the flux and the surface becomes increasingly acute. Depositing non-uniformly, so that the coating becomes progressively thinner as quality deteriorates, followed by uniformly removing some of the coating, such as by resputtering, eliminates the poor quality portions, leaving only high quality portions of the coating. Subsequently sputtering from a different direction applies a high quality coating to other regions of the surface. Such steps can be performed either simultaneously or sequentially to apply coatings of a uniformly high quality,more » closed microstructure to three-dimensional or large planar surfaces.« less

Inventors:
 [1];  [1];  [1]
  1. (Richland, WA)
Publication Date:
Research Org.:
BATTELLE MEMORIAL INSTITUTE
OSTI Identifier:
865146
Patent Number(s):
US 4468437
Assignee:
Battelle Memorial Institute (Richland, WA) PNNL
DOE Contract Number:  
AC06-76RL01830
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
deposited; films; improved; microstructures; methods; improving; line-of-sight; described; columnar; growth; defects; ordinarily; produced; geometrical; shadowing; deposition; eliminated; resorting; post-deposition; thermal; mechanical; treatments; native; as-deposited; coating; qualities; including; homogeneity; fine; grain; size; coating-to-substrate; adherence; retained; preferred; method; steps; emitting; material; source; substrate; deposit; non-uniformly; surface; removing; portion; uniformly; depositing; direction; repeating; foregoing; quality; sputtering; progressively; deteriorates; angle; incidence; flux; increasingly; acute; thinner; followed; resputtering; eliminates; poor; portions; leaving; subsequently; applies; regions; performed; simultaneously; sequentially; apply; coatings; closed; microstructure; three-dimensional; planar; surfaces; planar surfaces; deposited coating; depositing material; preferred method; grain size; substrate surface; planar surface; deposited films; poor quality; coating uniformly; coating qualities; fine grain; improved microstructures; line-of-sight deposited; columnar growth; ordinarily produced; emitting material; deposited film; geometrical shadowing; growth defects; improving microstructures; mechanical treatment; defects ordinarily; /428/204/427/

Citation Formats

Patten, James W., Moss, Ronald W., and McClanahan, Edwin D.. Deposited films with improved microstructures. United States: N. p., 1984. Web.
Patten, James W., Moss, Ronald W., & McClanahan, Edwin D.. Deposited films with improved microstructures. United States.
Patten, James W., Moss, Ronald W., and McClanahan, Edwin D.. Sun . "Deposited films with improved microstructures". United States. https://www.osti.gov/servlets/purl/865146.
@article{osti_865146,
title = {Deposited films with improved microstructures},
author = {Patten, James W. and Moss, Ronald W. and McClanahan, Edwin D.},
abstractNote = {Methods for improving microstructures of line-of-sight deposited films are described. Columnar growth defects ordinarily produced by geometrical shadowing during deposition of such films are eliminated without resorting to post-deposition thermal or mechanical treatments. The native, as-deposited coating qualities, including homogeneity, fine grain size, and high coating-to-substrate adherence, can thus be retained. The preferred method includes the steps of emitting material from a source toward a substrate to deposit a coating non-uniformly on the substrate surface, removing a portion of the coating uniformly over the surface, again depositing material onto the surface, but from a different direction, and repeating the foregoing steps. The quality of line-of-sight deposited films such as those produced by sputtering, progressively deteriorates as the angle of incidence between the flux and the surface becomes increasingly acute. Depositing non-uniformly, so that the coating becomes progressively thinner as quality deteriorates, followed by uniformly removing some of the coating, such as by resputtering, eliminates the poor quality portions, leaving only high quality portions of the coating. Subsequently sputtering from a different direction applies a high quality coating to other regions of the surface. Such steps can be performed either simultaneously or sequentially to apply coatings of a uniformly high quality, closed microstructure to three-dimensional or large planar surfaces.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1984},
month = {1}
}

Patent:

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