Optical double-slit particle measuring system

Patent · 01 January 1984

OSTI ID:864942

Hencken, Kenneth R ^[1]; Tichenor, Daniel A ^[2]; Wang, James C. F. ^[3]

---

1. Pleasanton, CA
2. Freemont, CA
3. Livermore, CA

A method for in situ measurement of particle size is described. The size information is obtained by scanning an image of the particle across a double-slit mask and observing the transmitted light. This method is useful when the particle size of primary interest is 3 .mu.m and larger. The technique is well suited to applications in which the particles are non-spherical and have unknown refractive index. It is particularly well suited to high temperature environments in which the particle incandescence provides the light source.

• Research Organization: AT & T CORP
• DOE Contract Number: AC04-76DP00789
• Assignee: United States of America as represented by United States (Washington, DC)
• Patent Number(s): US 4441816
• OSTI ID: 864942
• Country of Publication: United States
• Language: English

Related Subjects

/356/
applications
described
double-slit
environments
image
incandescence
index
information
larger
light
light source
mask
measurement
measuring
method
non-spherical
observing
obtained
optical
particle
particle size
particles
particularly
primary
provides
refractive
refractive index
scanning
situ
situ measurement
size
size information
source
suited
technique
temperature
temperature environment
temperature environments
transmitted
transmitted light
useful