Methods for making deposited films with improved microstructures

Patent · Fri Jan 01 00:00:00 EST 1982

OSTI ID:864249

Patten, James W ^[1]; Moss, Ronald W ^[1]; McClanahan, Edwin D ^[1]

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1. Richland, WA

Methods for improving microstructures of line-of-sight deposited films are described. Columnar growth defects ordinarily produced by geometrical shadowing during deposition of such films are eliminated without resorting to post-deposition thermal or mechanical treatments. The native, as-deposited coating qualities, including homogeneity, fine grain size, and high coating-to-substrate adherence, can thus be retained. The preferred method includes the steps of emitting material from a source toward a substrate to deposit a coating non-uniformly on the substrate surface, removing a portion of the coating uniformly over the surface, again depositing material onto the surface, but from a different direction, and repeating the foregoing steps. The quality of line-of-sight deposited films such as those produced by sputtering, progressively deteriorates as the angle of incidence between the flux and the surface becomes increasingly acute. Depositing non-uniformly, so that the coating becomes progressively thinner as quality deteriorates, followed by uniformly removing some of the coating, such as by resputtering, eliminates the poor quality portions, leaving only high quality portions of the coating. Subsequently sputtering from a different direction applies a high quality coating to other regions of the surface. Such steps can be performed either simultaneously or sequentially to apply coatings of a uniformly high quality, closed microstructure to three-dimensional or larger planar surfaces.

• Research Organization: Battelle Memorial Institute, Columbus, OH (United States)
• DOE Contract Number: AC06-76RL01830
• Assignee: Battelle Memorial Institute (Richland, WA)
• Patent Number(s): US 4336118
• OSTI ID: 864249
• Country of Publication: United States
• Language: English

Related Subjects

methods
deposited
films
improved
microstructures
improving
line-of-sight
described
columnar
growth
defects
ordinarily
produced
geometrical
shadowing
deposition
eliminated
resorting
post-deposition
thermal
mechanical
treatments
native
as-deposited
coating
qualities
including
homogeneity
fine
grain
size
coating-to-substrate
adherence
retained
preferred
method
steps
emitting
material
source
substrate
deposit
non-uniformly
surface
removing
portion
uniformly
depositing
direction
repeating
foregoing
quality
sputtering
progressively
deteriorates
angle
incidence
flux
increasingly
acute
thinner
followed
resputtering
eliminates
poor
portions
leaving
subsequently
applies
regions
performed
simultaneously
sequentially
apply
coatings
closed
microstructure
three-dimensional
larger
planar
surfaces
planar surfaces
deposited coating
depositing material
preferred method
grain size
substrate surface
planar surface
deposited films
poor quality
coating uniformly
coating qualities
fine grain
improved microstructures
line-of-sight deposited
columnar growth
ordinarily produced
emitting material
deposited film
geometrical shadowing
growth defects
improving microstructures
mechanical treatment
defects ordinarily
/204/427/