Control of impurities in toroidal plasma devices
Abstract
A method and apparatus for plasma impurity control in closed flux plasma systems such as Tokamak reactors is disclosed. Local axisymmetrical injection of hydrogen gas is employed to reverse the normally inward flow of impurities into the plasma.
- Inventors:
-
- La Jolla, CA
- Publication Date:
- Research Org.:
- General Atomics, San Diego, CA (United States)
- OSTI Identifier:
- 863747
- Patent Number(s):
- US 4239594
- Assignee:
- United States of America as represented by United States (Washington, DC)
- DOE Contract Number:
- EY-76-C-03-0167
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- control; impurities; toroidal; plasma; devices; method; apparatus; impurity; closed; flux; systems; tokamak; reactors; disclosed; local; axisymmetrical; injection; hydrogen; gas; employed; reverse; normally; inward; flow; plasma devices; toroidal plasma; hydrogen gas; plasma device; impurity control; plasma systems; /376/173/
Citation Formats
Ohkawa, Tihiro. Control of impurities in toroidal plasma devices. United States: N. p., 1980.
Web.
Ohkawa, Tihiro. Control of impurities in toroidal plasma devices. United States.
Ohkawa, Tihiro. Tue .
"Control of impurities in toroidal plasma devices". United States. https://www.osti.gov/servlets/purl/863747.
@article{osti_863747,
title = {Control of impurities in toroidal plasma devices},
author = {Ohkawa, Tihiro},
abstractNote = {A method and apparatus for plasma impurity control in closed flux plasma systems such as Tokamak reactors is disclosed. Local axisymmetrical injection of hydrogen gas is employed to reverse the normally inward flow of impurities into the plasma.},
doi = {},
url = {https://www.osti.gov/biblio/863747},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1980},
month = {1}
}
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