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Control of impurities in toroidal plasma devices

Patent ·
OSTI ID:863747
 [1]
  1. La Jolla, CA
+ Show Author Affiliations

A method and apparatus for plasma impurity control in closed flux plasma systems such as Tokamak reactors is disclosed. Local axisymmetrical injection of hydrogen gas is employed to reverse the normally inward flow of impurities into the plasma.

Research Organization:
General Atomic Co., San Diego, Calif.
DOE Contract Number:
EY-76-C-03-0167
Assignee:
United States of America as represented by United States (Washington, DC)
Patent Number(s):
US 4239594
OSTI ID:
863747
Country of Publication:
United States
Language:
English

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Related Subjects

/376/173/
apparatus
axisymmetrical
closed
control
devices
disclosed
employed
flow
flux
gas
hydrogen
hydrogen gas
impurities
impurity
impurity control
injection
inward
local
method
normally
plasma
plasma device
plasma devices
plasma systems
reactors
reverse
systems
tokamak
toroidal
toroidal plasma