Gaseous trace impurity analyzer and method

Patent · Tue Jan 01 00:00:00 EST 1980

OSTI ID:863619

Schneider, William ^[1]

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1. Setauket, NY

Simple apparatus for analyzing trace impurities in a gas, such as helium or hydrogen, comprises means for drawing a measured volume of the gas as sample into a heated zone. A segregable portion of the zone is then chilled to condense trace impurities in the gas in the chilled portion. The gas sample is evacuated from the heated zone including the chilled portion. Finally, the chilled portion is warmed to vaporize the condensed impurities in the order of their boiling points. As the temperature of the chilled portion rises, pressure will develop in the evacuated, heated zone by the vaporization of an impurity. The temperature at which the pressure increase occurs identifies that impurity and the pressure increase attained until the vaporization of the next impurity causes a further pressure increase is a measure of the quantity of the preceding impurity.

• Research Organization: Brookhaven National Laboratory (BNL), Upton, NY (United States)
• DOE Contract Number: EY-76-C-02-0016
• Assignee: United States of America as represented by United States (Washington, DC)
• Patent Number(s): US 4214473
• OSTI ID: 863619
• Country of Publication: United States
• Language: English

Related Subjects

gaseous
trace
impurity
analyzer
method
simple
apparatus
analyzing
impurities
gas
helium
hydrogen
comprises
means
drawing
measured
volume
sample
heated
zone
segregable
portion
chilled
condense
evacuated
including
finally
warmed
vaporize
condensed
boiling
temperature
rises
pressure
vaporization
increase
occurs
identifies
attained
causes
measure
quantity
preceding
pressure increase
gas sample
trace impurities
comprises means
heated zone
simple apparatus
trace impurity
/73/374/