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Title: Device for providing high-intensity ion or electron beam

Abstract

A thin film of a low-thermionic-work-function material is maintained on the cathode of a device for producing a high-current, low-pressure gas discharge by means of sputter deposition from an auxiliary electrode. The auxiliary electrode includes a surface with a low-work-function material, such as thorium, uranium, plutonium or one of the rare earth elements, facing the cathode but at a disposition and electrical potential so as to extract ions from the gas discharge and sputter the low-work-function material onto the cathode. By continuously replenishing the cathode film, high thermionic emissions and ion plasmas can be realized and maintained over extended operating periods.

Inventors:
 [1];  [1]
  1. Richland, WA
Publication Date:
Research Org.:
Battelle Memorial Institute, Columbus, OH (United States)
OSTI Identifier:
862916
Patent Number(s):
US 4046666
Assignee:
United States of America as represented by United States Energy (Washington, DC)
DOE Contract Number:  
AC06-76RL01830
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
device; providing; high-intensity; electron; beam; film; low-thermionic-work-function; material; maintained; cathode; producing; high-current; low-pressure; gas; discharge; means; sputter; deposition; auxiliary; electrode; surface; low-work-function; thorium; uranium; plutonium; rare; earth; elements; facing; disposition; electrical; potential; extract; continuously; replenishing; thermionic; emissions; plasmas; realized; extended; operating; periods; low-pressure gas; auxiliary electrode; sputter deposition; earth elements; electrical potential; pressure gas; electron beam; rare earth; gas discharge; earth element; thermionic emission; extended operating; sputter deposit; /204/313/314/

Citation Formats

McClanahan, Edwin D, and Moss, Ronald W. Device for providing high-intensity ion or electron beam. United States: N. p., 1977. Web.
McClanahan, Edwin D, & Moss, Ronald W. Device for providing high-intensity ion or electron beam. United States.
McClanahan, Edwin D, and Moss, Ronald W. Sat . "Device for providing high-intensity ion or electron beam". United States. https://www.osti.gov/servlets/purl/862916.
@article{osti_862916,
title = {Device for providing high-intensity ion or electron beam},
author = {McClanahan, Edwin D and Moss, Ronald W},
abstractNote = {A thin film of a low-thermionic-work-function material is maintained on the cathode of a device for producing a high-current, low-pressure gas discharge by means of sputter deposition from an auxiliary electrode. The auxiliary electrode includes a surface with a low-work-function material, such as thorium, uranium, plutonium or one of the rare earth elements, facing the cathode but at a disposition and electrical potential so as to extract ions from the gas discharge and sputter the low-work-function material onto the cathode. By continuously replenishing the cathode film, high thermionic emissions and ion plasmas can be realized and maintained over extended operating periods.},
doi = {},
url = {https://www.osti.gov/biblio/862916}, journal = {},
number = ,
volume = ,
place = {United States},
year = {1977},
month = {1}
}

Patent:

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