Method and apparatus for reducing diffraction-induced damage in high power laser amplifier systems

Patent · Thu Jan 01 00:00:00 EST 1976

OSTI ID:862458

Campillo, Anthony J ^[1]; Newnam, Brian E ^[1]; Shapiro, Stanley L ^[1]

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1. Los Alamos, NM

Self-focusing damage caused by diffraction in laser amplifier systems may be minimized by appropriately tailoring the input optical beam profile by passing the beam through an aperture having a uniform high optical transmission within a particular radius r.sub.o and a transmission which drops gradually to a low value at greater radii. Apertures having the desired transmission characteristics may readily be manufactured by exposing high resolution photographic films and plates to a diffuse, disk-shaped light source and mask arrangement.

• Research Organization: Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
• DOE Contract Number: W-7405-ENG-36
• Assignee: United States of America as represented by United States Energy (Washington, DC)
• Patent Number(s): US 3935545
• OSTI ID: 862458
• Country of Publication: United States
• Language: English

Related Subjects

method
apparatus
reducing
diffraction-induced
damage
power
laser
amplifier
systems
self-focusing
caused
diffraction
minimized
appropriately
tailoring
input
optical
beam
profile
passing
aperture
uniform
transmission
particular
radius
drops
gradually
value
radii
apertures
desired
characteristics
readily
manufactured
exposing
resolution
photographic
films
plates
diffuse
disk-shaped
light
source
mask
arrangement
transmission characteristics
optical transmission
optical beam
light source
laser amplifier
power laser
damage caused
beam profile
photographic film
input optical
solution ph
amplifier systems
/372/359/