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Title: Transmission electron microscopy based study of epitaxy inNb/(100)Cu bilayer and Cu/Nb/(100)Cu trilayer nanoscale films

Abstract

No abstract prepared.

Authors:
; ;
Publication Date:
Research Org.:
Ernest Orlando Lawrence Berkeley NationalLaboratory, Berkeley, CA (US)
Sponsoring Org.:
USDOE Director. Office of Science. Office of Basic EnergySciences
OSTI Identifier:
861558
Report Number(s):
LBNL-57830
Journal ID: ISSN 0003-6951; APPLAB; R&D Project: 503601; BnR: KC0201010; TRN: US200601%%50
DOE Contract Number:  
DE-AC02-05CH11231
Resource Type:
Journal Article
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 86; Related Information: Journal Publication Date: 2005; Journal ID: ISSN 0003-6951
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; EPITAXY; TRANSMISSION ELECTRON MICROSCOPY; NIOBIUM; COPPER; LAMELLAE; NANOSTRUCTURES

Citation Formats

Mitlin, D, Schmid, A K, and Radmilovic, V. Transmission electron microscopy based study of epitaxy inNb/(100)Cu bilayer and Cu/Nb/(100)Cu trilayer nanoscale films. United States: N. p., 2005. Web. doi:10.1063/1.1850195.
Mitlin, D, Schmid, A K, & Radmilovic, V. Transmission electron microscopy based study of epitaxy inNb/(100)Cu bilayer and Cu/Nb/(100)Cu trilayer nanoscale films. United States. https://doi.org/10.1063/1.1850195
Mitlin, D, Schmid, A K, and Radmilovic, V. Tue . "Transmission electron microscopy based study of epitaxy inNb/(100)Cu bilayer and Cu/Nb/(100)Cu trilayer nanoscale films". United States. https://doi.org/10.1063/1.1850195.
@article{osti_861558,
title = {Transmission electron microscopy based study of epitaxy inNb/(100)Cu bilayer and Cu/Nb/(100)Cu trilayer nanoscale films},
author = {Mitlin, D and Schmid, A K and Radmilovic, V},
abstractNote = {No abstract prepared.},
doi = {10.1063/1.1850195},
url = {https://www.osti.gov/biblio/861558}, journal = {Applied Physics Letters},
issn = {0003-6951},
number = ,
volume = 86,
place = {United States},
year = {2005},
month = {6}
}