Transmission electron microscopy based study of epitaxy inNb/(100)Cu bilayer and Cu/Nb/(100)Cu trilayer nanoscale films

Mitlin, D; Schmid, A K; Radmilovic, V

doi:10.1063/1.1850195

Title: Transmission electron microscopy based study of epitaxy inNb/(100)Cu bilayer and Cu/Nb/(100)Cu trilayer nanoscale films

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Abstract

No abstract prepared.

Authors:: Mitlin, D; Schmid, A K; Radmilovic, V

Publication Date:: 2005-06-21

Research Org.:: Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)

Sponsoring Org.:: USDOE Director. Office of Science. Office of Basic EnergySciences

OSTI Identifier:: 861558

Report Number(s):: LBNL-57830
Journal ID: ISSN 0003-6951; APPLAB; R&D Project: 503601; BnR: KC0201010; TRN: US200601%%50

DOE Contract Number:: DE-AC02-05CH11231

Resource Type:: Journal Article

Journal Name:: Applied Physics Letters

Additional Journal Information:: Journal Volume: 86; Related Information: Journal Publication Date: 2005; Journal ID: ISSN 0003-6951

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE; EPITAXY; TRANSMISSION ELECTRON MICROSCOPY; NIOBIUM; COPPER; LAMELLAE; NANOSTRUCTURES

Citation Formats


                    Mitlin, D, Schmid, A K, and Radmilovic, V. Transmission electron microscopy based study of epitaxy inNb/(100)Cu bilayer and Cu/Nb/(100)Cu trilayer nanoscale films.  United States: N. p., 2005. 
        Web.  doi:10.1063/1.1850195.

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                    Mitlin, D, Schmid, A K, & Radmilovic, V. Transmission electron microscopy based study of epitaxy inNb/(100)Cu bilayer and Cu/Nb/(100)Cu trilayer nanoscale films.  United States.  https://doi.org/10.1063/1.1850195

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                    Mitlin, D, Schmid, A K, and Radmilovic, V. 2005.  
        "Transmission electron microscopy based study of epitaxy inNb/(100)Cu bilayer and Cu/Nb/(100)Cu trilayer nanoscale films".  United States.  https://doi.org/10.1063/1.1850195.

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@article{osti_861558,

  title        = {Transmission electron microscopy based study of epitaxy inNb/(100)Cu bilayer and Cu/Nb/(100)Cu trilayer nanoscale films},

  author       = {Mitlin, D and Schmid, A K and Radmilovic, V},

  abstractNote = {No abstract prepared.},

  doi          = {10.1063/1.1850195},

  url          = {https://www.osti.gov/biblio/861558},
  journal      = {Applied Physics Letters},

  issn         = {0003-6951},

  number       = ,

  volume       = 86,

  place        = {United States},

  year         = {2005},

  month        = {6}

}

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