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Title: In situ atomic force microscopy imaging of electrodeposition of mixed layers of copper/cuprous oxide

Journal Article · · Journal of the Electrochemical Society
DOI:https://doi.org/10.1149/1.1392598· OSTI ID:840214

No abstract prepared.

Research Organization:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Organization:
USDOE. Assistant Secretary for Energy Efficiency and Renewable Energy. Office of the Vehicle Technology Program; France-Berkeley Fund, Centre National d'Etudes Spatiales contract 97/151077300 (US)
DOE Contract Number:
AC03-76SF00098
OSTI ID:
840214
Report Number(s):
LBNL-43691; JESOAN; R&D Project: 474001; TRN: US200509%%938
Journal Information:
Journal of the Electrochemical Society, Vol. 146, Issue 11; Other Information: Journal Publication Date: 1999; PBD: 8 Jul 1999; ISSN 0013-4651
Country of Publication:
United States
Language:
English

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