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Title: Characterization of EUVL mask defects from EUV far-field scattering patterns

Abstract

No abstract prepared.

Authors:
; ; ;
Publication Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE Director. Office of Energy Research. Office of Basic Energy Sciences; Defense Advanced Research Projects Agency Grant MDA972-97-1-0010; Synchrotron Radiation Center Contract 96-LC-460 (US)
OSTI Identifier:
834295
Report Number(s):
LBNL-46758
R&D Project: 509201; TRN: US200432%%224
DOE Contract Number:  
AC03-76SF00098
Resource Type:
Journal Article
Journal Name:
Journal of Vacuum Science and Technology B
Additional Journal Information:
Journal Volume: 18; Journal Issue: 6; Other Information: Journal Publication Date: 2000; PBD: 9 Jun 2000
Country of Publication:
United States
Language:
English
Subject:
47 OTHER INSTRUMENTATION; DEFECTS; SCATTERING; LAWRENCE BERKELEY LABORATORY

Citation Formats

Yi, Moonsuk, Jeong, Seongtae, Rekawa, Seno, and Bokor, Jeffrey. Characterization of EUVL mask defects from EUV far-field scattering patterns. United States: N. p., 2000. Web. doi:10.1116/1.1319843.
Yi, Moonsuk, Jeong, Seongtae, Rekawa, Seno, & Bokor, Jeffrey. Characterization of EUVL mask defects from EUV far-field scattering patterns. United States. doi:10.1116/1.1319843.
Yi, Moonsuk, Jeong, Seongtae, Rekawa, Seno, and Bokor, Jeffrey. Fri . "Characterization of EUVL mask defects from EUV far-field scattering patterns". United States. doi:10.1116/1.1319843.
@article{osti_834295,
title = {Characterization of EUVL mask defects from EUV far-field scattering patterns},
author = {Yi, Moonsuk and Jeong, Seongtae and Rekawa, Seno and Bokor, Jeffrey},
abstractNote = {No abstract prepared.},
doi = {10.1116/1.1319843},
journal = {Journal of Vacuum Science and Technology B},
number = 6,
volume = 18,
place = {United States},
year = {2000},
month = {6}
}