Thermal Annealing Characteristics of Si and Mg-implanted GaN Thin Films
Journal Article
·
· Applied Physics Letters
OSTI ID:833539
No abstract prepared.
- Research Organization:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE; National Science Foundation. UC-Berkeley Microfabrication Lab and Integrated Materials Laboratory, Air Force Office of Scientific Research (AFOSR/JSEP) under Contract F49620-94-C-0038 (US)
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 833539
- Report Number(s):
- LBL-37372; APPLAB; TRN: US0406722
- Journal Information:
- Applied Physics Letters, Vol. 68, Issue 19; Other Information: Journal Publication Date: May 6, 1996; PBD: 1 Jun 1995; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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