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Title: Recombination Parameters in InGaAsSb Epitaxial Layers for Thermophotovoltaic Applications

Technical Report ·
DOI:https://doi.org/10.2172/821373· OSTI ID:821373

Radio-frequency (RF) photoreflectance measurements and one-dimensional device simulations have been used to evaluate bulk recombination parameter and surface recombination velocity (SRV) in doubly-capped 0.55 eV, 2 x 10{sup 17} cm{sup -3} doped p-InGaAsSb epitaxial layers for thermophotovoltaic (TPV) applications. Bulk lifetimes of 90-100 ns and SRVs of 680 cm/s to 3200 cm/s (depending on the capping layer) are obtained, with higher doping and higher bandgap capping layers most effective in reducing SRV. RF photoreflectance measurements and one-dimensional device simulations are compatible with a radiative recombination coefficient (B) of 3 x 10{sup -11} cm{sup 3}/s and Auger coefficient (C) of 1 x 10{sup -28} cm{sup 6}/s.

Research Organization:
Lockheed Martin Corporation, Schenectady, NY 12301 (US)
Sponsoring Organization:
US Department of Energy (US)
DOE Contract Number:
AC12-00SN39357
OSTI ID:
821373
Report Number(s):
LM-03K035; TRN: US200411%%37
Resource Relation:
Other Information: PBD: 17 Mar 2003
Country of Publication:
United States
Language:
English

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