High-performance Mo-Si multilayer coatings for extreme-ultraviolet lithography by ion-beam deposition
No abstract prepared.
- Research Organization:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE Director. Office of Science. Basic Energy Sciences (US)
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 816559
- Report Number(s):
- LBNL-53433; APOPAI; R&D Project: 509201; TRN: US200320%%636
- Journal Information:
- Applied Optics, Vol. 42, Issue 19; Other Information: Journal Publication Date: 2003; PBD: 1 Jul 2003; ISSN 0003-6935
- Country of Publication:
- United States
- Language:
- English
Similar Records
Stress, reflectance, and temporal stability of sputter-deposited Mo/Si and Mo/Be multilayer films for extreme ultraviolet lithography
Lifetime studies of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography
Mo/Si/and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography
Journal Article
·
Fri Jan 01 00:00:00 EST 1999
· Optical Engineering
·
OSTI ID:816559
Lifetime studies of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography
Conference
·
Thu Jul 01 00:00:00 EDT 1999
·
OSTI ID:816559
+5 more
Mo/Si/and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography
Journal Article
·
Sat Apr 01 00:00:00 EST 2000
· Applied Optics
·
OSTI ID:816559