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Title: Pressure Waves Induced by Megasonic Agitation in a LIGA Development Tank

Abstract

Megasonic agitation is used to improve the uniformity of the LIGA{sup 1} development process. To investigate the acoustic wave fields induced by megasonic agitation, we compute wave fields for a development tank containing a submerged wafer and for a typical trench-like feature on the wafer face. This separate treatment of these two problems is advantageous, because the length scales of the tank and the feature differ by three to four orders of magnitude. A spectral method based on Green's functions is used to construct the acoustic wave field, avoiding the alternative of solving partial differential equations over the entire domain. The total acoustic wave field is obtained by superposing of the primary wave field and the first reflected wave field, which are computed in sequence without any need for iterations. The wafer interference to the wave field is treated directly by a priori recognition of shadow regions in the primary field and a concept of boundary of dependence in the reflected field. Unlike a divergent wave field produced by ultrasonic agitation, results show that the wave field in the tank becomes narrowly focused at megasonic frequencies such that the most effective agitation is confined in a region directly above themore » acoustic source; this numerical expectation has been verified analytically and further confirmed experimentally by Sandia's LIGA Group.{sup [13]} The amplitude of the focused wave pressure is proportional to square root of the wave frequency. The wave pattern in a feature cavity also depends strongly on the orientation of the wafer and the aspect ratio of the cavity. It is concluded that the LIGA development process will be greatly accelerated, if the orientation and the location of the immersed wafer is arranged so that the wafer spends more time in the focused wave field of high frequency agitation.« less

Authors:
Publication Date:
Research Org.:
Sandia National Labs., Albuquerque, NM (US); Sandia National Labs., Livermore, CA (US)
Sponsoring Org.:
US Department of Energy (US)
OSTI Identifier:
799150
Report Number(s):
SAND2002-8333
TRN: US200221%%100
DOE Contract Number:
AC04-94AL85000
Resource Type:
Technical Report
Resource Relation:
Other Information: PBD: 1 Aug 2002
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; AMPLITUDES; PARTIAL DIFFERENTIAL EQUATIONS; ULTRASONIC WAVES; PRESSURIZATION; TANKS; MICROELECTRONIC CIRCUITS; MANUFACTURING

Citation Formats

Aili Ting. Pressure Waves Induced by Megasonic Agitation in a LIGA Development Tank. United States: N. p., 2002. Web. doi:10.2172/799150.
Aili Ting. Pressure Waves Induced by Megasonic Agitation in a LIGA Development Tank. United States. doi:10.2172/799150.
Aili Ting. Thu . "Pressure Waves Induced by Megasonic Agitation in a LIGA Development Tank". United States. doi:10.2172/799150. https://www.osti.gov/servlets/purl/799150.
@article{osti_799150,
title = {Pressure Waves Induced by Megasonic Agitation in a LIGA Development Tank},
author = {Aili Ting},
abstractNote = {Megasonic agitation is used to improve the uniformity of the LIGA{sup 1} development process. To investigate the acoustic wave fields induced by megasonic agitation, we compute wave fields for a development tank containing a submerged wafer and for a typical trench-like feature on the wafer face. This separate treatment of these two problems is advantageous, because the length scales of the tank and the feature differ by three to four orders of magnitude. A spectral method based on Green's functions is used to construct the acoustic wave field, avoiding the alternative of solving partial differential equations over the entire domain. The total acoustic wave field is obtained by superposing of the primary wave field and the first reflected wave field, which are computed in sequence without any need for iterations. The wafer interference to the wave field is treated directly by a priori recognition of shadow regions in the primary field and a concept of boundary of dependence in the reflected field. Unlike a divergent wave field produced by ultrasonic agitation, results show that the wave field in the tank becomes narrowly focused at megasonic frequencies such that the most effective agitation is confined in a region directly above the acoustic source; this numerical expectation has been verified analytically and further confirmed experimentally by Sandia's LIGA Group.{sup [13]} The amplitude of the focused wave pressure is proportional to square root of the wave frequency. The wave pattern in a feature cavity also depends strongly on the orientation of the wafer and the aspect ratio of the cavity. It is concluded that the LIGA development process will be greatly accelerated, if the orientation and the location of the immersed wafer is arranged so that the wafer spends more time in the focused wave field of high frequency agitation.},
doi = {10.2172/799150},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Thu Aug 01 00:00:00 EDT 2002},
month = {Thu Aug 01 00:00:00 EDT 2002}
}

Technical Report:

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  • During acoustically stimulated LIGA development, a wafer receives sound waves from both sides at a wide variety of incidence angles that vary in time depending on the orientation of the wafer relative to the multiple transducers that are typically actuated in a periodic sequence. It is important to understand the influence of these variables on the transmission of energy through the wafer as well as the induced motion of the wafer itself because these processes impact the induced acoustic streaming of the fluid within features, the mechanism presently thought responsible for enhanced development of LIGA features. In the present work,more » the impact of wafer elasticity on LIGA development is investigated. Transmission waves, wafer bending waves, and the related concepts such as critical bending frequency, mechanical impedance, coincidence, and resonance, are discussed. Supercritical-frequency incident waves induce supersonic bending waves in the wafer. Incident wave energy is channeled into three components, transmitted, reflected and energy deposited to the wafer, depending on the wafer material, thickness and wave incidence angle. Results show at normal incidence for a 1-mm PMMA wafer, about 47% of the wave energy is deposited in the wafer. The wafer gains almost half of the incident energy, a result that agrees well with the Bankert et a1 measurements. In LIGA development, transmitted waves may sometimes produce strong acoustic motion of the developer on the wafer backside, especially for the so-called coincidence case in which almost all incident wave energy transfers to the backside. Wafer bending waves cause wafer oscillation at high frequency, promoting the development process, but features shaking may weaken their attachments to the substrate. Resonance is not likely for the entire wafer, but may occur in short and wide wafer feature columns, which are least likely to break away from the substrate, perhaps resulting in good agitation of the fluid in adjacent feature cavities.« less
  • The major goals to develop a cleaning and drying system for processing at least 2500 three-in.-diameter wafers per hour and to reduce the process cost were achieved. The new system consists of an ammonia-hydrogen peroxide bath in which both surfaces of 3/32-in.-spaced, ion-implanted wafers are cleaned in quartz carriers moved on a belt past two pairs of Megasonic transducers. The wafers are dried in the novel room-temperature, high-velocity air dryer in the same carriers used for annealing. A new laser scanner was used effectively to monitor the cleaning ability on a sampling basis. The following factors contribute to the improvedmore » effectiveness of the process: (1) recirculation and filtration of the cleaning solution permit it to be used for at least 100,000 wafers with only a relatively small amount of chemical make-up before discarding; (2) uniform cleanliness is achieved because both sides of the wafer are Megasonically scrubbed to remove particulate impurities; (3) the novel dryer permits wafers to be dried in a high-velocity room-temperature air stream on a moving belt in their quartz carriers; and (4) the personnel safety of such a system is excellent and waste disposal has no adverse ecological impact. With the addition of mechanical transfer arms, two systems like the one developed will produce enough cleaned wafers for a 30-MW/year production facility. A projected scale-up well within the existing technology would permit a system to be assembled that produces about 12,745 wafers per hour; about 11 such systems, each occupying about 110 square feet, would be needed for each cleaning stage of a 500-MW/year production facility.« less
  • The Megasonic system consisting of the cleaning and rinse tank, the air dryer with the belt drive, and the laser defect scanner, has now been completely assembled, debugged, and tested in the laboratory at various power levels and belt speeds. The results indicate that wafer-throughput design targets have been met and exceeded. At the recommended power input of 160 W per transducer about 4500 wafers per hour can be cleaned and at least 2600 wafer per hour can be dried in 3/32-in.-spaced quartz carriers. As experience accumulated, several sources of contamination were identified. These included turbulence in the laminar-flow airmore » stream, causing unfiltered room air to be inducted into the working area; the temporary aluminum supports for the quartz carriers; wash water contaminated with colloid, leading to slow and inadequate rinse rate; and leaks in the seal between the laminar-flow station and the belt drive. The laser scanner was found to be an excellent diagnostic tool: the pattern of scattering centers displayed on the storage 'scope is almost always indicative of the cause of the problem, be it dust, poor water, or surface defects on the wafer. The solar-cell evaluation test carried out with 22 Megasonically cleaned and 18 system-Z-cleaned solar cells has been completed. It confirms that the Megasonically cleaned cells have higher average efficiency. However, about 17% of the Z-cleaned cells are considerably poorer than the rest; if these are not included, the distribution of the remaining 83% is statistically indistinguishable from that of the Megasonically cleaned ones. It is tentatively concluded that Megasonic cleaning produces a more uniform product with fewer really poor cells, but not cells with an efficiency greater than the maximum attained by Z-cleaned cells.« less
  • During this period the total Megasonic system has been operated regularly and is functioning well. The most critical missing part is the belt drive for the air-drying system; delivery of this drive is now scheduled for the end of January. Preliminary data on wafer cleaning and rinsing indicate that the design criteria of cleaning ability, ease of operation, and safety have been largely achieved. Chemicals utilization appears to be even better than anticipated.
  • The Megasonic cleaning system was integrated and debugged. The system consists of the Megasonic cleaning sink, a rinse station, an air dryer, and an inspection station equipped with a laser scanner for the detection of light-scattering centers on a wafer. The recirculation-filtration system is operating satisfactorily. The preliminary data on wafer cleaning and rinsing indicate that the design criteria of cleaning ability, chemicals usage, ease of operation, and safety have been largely met. Further work on production rate is needed. The air dryer has been demonstrated to function. Its true throughput can be evaluated only when the belt drive hasmore » been installed. The long delivery time will cause some delay in moving the system to the RCA Mountaintop location for production evaluation.« less