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Title: Quarterly Report for High NA Optics Development: Q3-1999 International Sematech Project LITH 112

Abstract

This quarterly report provides a status update for each of the milestones for the International Sematech project on the development of high-NA optics for a small-field EUVL exposure tool. The optical design has been completed, which employs two aspheric mirrors yielding diffraction-limited imaging within a 600 {micro}m x 200 {micro}m field with a numerical aperture of 0.3 and a 5x reduction. Preliminary aerial image calculations show good resolution of 30nm features with partially coherent illumination. Contracts have been awarded for the fabrication and multilayer coating of the mirror elements and a detailed specification package has been generated for one of the mirror substrates (M1). Metrology instrumentation is being assembled and fabrication has been initiated on M1. Key progress includes the design and fabrication of kinematic mounting fixtures that enable the vendor to perform interferometry in a geometry compatible with PO Box fixturing. The first substrate is proceeding according to schedule, with delivery expected in December 1999.

Authors:
Publication Date:
Research Org.:
Lawrence Livermore National Lab., CA (US)
Sponsoring Org.:
USDOE Office of Defense Programs (DP) (US)
OSTI Identifier:
793706
Report Number(s):
UCRL-ID-136139
TRN: US200221%%104
DOE Contract Number:  
W-7405-Eng-48
Resource Type:
Technical Report
Resource Relation:
Other Information: PBD: 8 Oct 1999
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; APERTURES; COATINGS; DESIGN; FABRICATION; ILLUMINANCE; INTERFEROMETRY; MIRRORS; OPTICS; RESOLUTION; EXTREME ULTRAVIOLET RADIATION

Citation Formats

Taylor, J S. Quarterly Report for High NA Optics Development: Q3-1999 International Sematech Project LITH 112. United States: N. p., 1999. Web. doi:10.2172/793706.
Taylor, J S. Quarterly Report for High NA Optics Development: Q3-1999 International Sematech Project LITH 112. United States. doi:10.2172/793706.
Taylor, J S. Fri . "Quarterly Report for High NA Optics Development: Q3-1999 International Sematech Project LITH 112". United States. doi:10.2172/793706. https://www.osti.gov/servlets/purl/793706.
@article{osti_793706,
title = {Quarterly Report for High NA Optics Development: Q3-1999 International Sematech Project LITH 112},
author = {Taylor, J S},
abstractNote = {This quarterly report provides a status update for each of the milestones for the International Sematech project on the development of high-NA optics for a small-field EUVL exposure tool. The optical design has been completed, which employs two aspheric mirrors yielding diffraction-limited imaging within a 600 {micro}m x 200 {micro}m field with a numerical aperture of 0.3 and a 5x reduction. Preliminary aerial image calculations show good resolution of 30nm features with partially coherent illumination. Contracts have been awarded for the fabrication and multilayer coating of the mirror elements and a detailed specification package has been generated for one of the mirror substrates (M1). Metrology instrumentation is being assembled and fabrication has been initiated on M1. Key progress includes the design and fabrication of kinematic mounting fixtures that enable the vendor to perform interferometry in a geometry compatible with PO Box fixturing. The first substrate is proceeding according to schedule, with delivery expected in December 1999.},
doi = {10.2172/793706},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1999},
month = {10}
}

Technical Report:

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